Inventor · disambiguated record
Nobutaka Magome
Also filed as: MAGOME NOBUTAKA
73 granted patents·20 pending applications·2,947 citations·filing 1985–2019
99Inventor score
Top patents by PatentIndex Score
93 records- 0199US7483119B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Jan 27, 2009·76 cites·102 claims
- 0299US7460207B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Granted Dec 2, 2008·87 cites·54 claims
- 0399US7379158B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2006·Granted May 27, 2008·85 cites·49 claims
- 0498US7466392B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2006·Granted Dec 16, 2008·30 cites·20 claims
- 0598US7436487B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2006·Granted Oct 14, 2008·75 cites·40 claims
- 0698US4710026APosition detection apparatusNIPPON KOGAKU KK·Filed 1986·Granted Dec 1, 1987·134 cites·17 claims
- 0797US7515246B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2006·Granted Apr 7, 2009·26 cites·49 claims
- 0897US5402224ADistortion inspecting method for projection optical systemNIKON CORP·Filed 1993·Granted Mar 28, 1995·150 cites·3 claims
- 0996US7911582B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Granted Mar 22, 2011·15 cites·40 claims
- 1096US7505115B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusNIKON CORP·Filed 2006·Granted Mar 17, 2009·19 cites·42 claims
- 1196US6876946B2Alignment method and apparatus thereforNIKON CORP·Filed 2002·Granted Apr 5, 2005·80 cites·25 claims
- 1296US6078380AProjection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposureNIKON CORP·Filed 1999·Granted Jun 20, 2000·165 cites·56 claims
- 1395US6118516AProjection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patternsNIKON CORP·Filed 1997·Granted Sep 12, 2000·134 cites·35 claims
- 1495US5489986APosition detecting apparatusNIKON CORP·Filed 1994·Granted Feb 6, 1996·119 cites·8 claims
- 1594US6538740B1Adjusting method for position detecting apparatusNIKON CORP·Filed 2000·Granted Mar 25, 2003·64 cites·36 claims
- 1693US6278957B1Alignment method and apparatus thereforNIKON CORP·Filed 1999·Granted Aug 21, 2001·116 cites·8 claims
- 1792US6677088B2Photomask producing method and apparatus and device manufacturing methodNIKON CORP·Filed 2002·Granted Jan 13, 2004·42 cites·34 claims
- 1892US5160849ADiffraction-type displacement detector for alignment of mask and waferNIKON CORP·Filed 1991·Granted Nov 3, 1992·81 cites·7 claims
- 1992US5151750AAlignment apparatusNIKON CORP·Filed 1990·Granted Sep 29, 1992·88 cites·13 claims
- 2091US5004348AAlignment deviceNIKON CORP·Filed 1990·Granted Apr 2, 1991·70 cites·16 claims
- 2190US9760026B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusNIKON CORP·Filed 2016·Granted Sep 12, 2017·2 cites·91 claims
- 2290US8749757B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusNIKON CORP·Filed 2013·Granted Jun 10, 2014·4 cites·125 claims
- 2390US5966201AMark for position detection, and mark detecting method and apparatusNIKON CORP·Filed 1997·Granted Oct 12, 1999·68 cites·34 claims
- 2490US5521036APositioning method and apparatusNIKON CORP·Filed 1995·Granted May 28, 1996·103 cites·17 claims
- 2590US5347356ASubstrate aligning device using interference light generated by two beams irradiating diffraction gratingNIKON CORP·Filed 1992·Granted Sep 13, 1994·71 cites·19 claims
- 2689US5576829AMethod and apparatus for inspecting a phase-shifted maskNIKON CORP·Filed 1995·Granted Nov 19, 1996·75 cites·29 claims
- 2788US5587794ASurface position detection apparatusNIKON CORP·Filed 1994·Granted Dec 24, 1996·45 cites·36 claims
- 2888US5070250APosition detection apparatus with adjustable beam and interference fringe positionsNIKON CORP·Filed 1991·Granted Dec 3, 1991·61 cites·2 claims
- 2987US6160619AProjection exposure apparatus having compact substrate stageNIKON CORP·Filed 1999·Granted Dec 12, 2000·78 cites·24 claims
- 3087US5118953ASubstrate alignment apparatus using diffracted and reflected radiation beamsNIKON CORP·Filed 1990·Granted Jun 2, 1992·54 cites·11 claims
- 3186US9494871B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusNIKON CORP·Filed 2014·Granted Nov 15, 2016·2 cites·52 claims
- 3285US9019467B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Apr 28, 2015·2 cites·35 claims
- 3385US8040491B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Granted Oct 18, 2011·4 cites·16 claims
- 3485US5343270AProjection exposure apparatusNIKON CORP·Filed 1992·Granted Aug 30, 1994·40 cites·14 claims
- 3584US5805866AAlignment methodNIKON CORP·Filed 1997·Granted Sep 8, 1998·76 cites·34 claims
- 3684US5734478AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Mar 31, 1998·55 cites·23 claims
- 3784US5289231AApparatus for manufacturing disc mediumNIKON CORP·Filed 1992·Granted Feb 22, 1994·44 cites·1 claims
- 3882US5171999AAdjustable beam and interference fringe positionNIKON CORP·Filed 1991·Granted Dec 15, 1992·40 cites·9 claims
- 3981US6320195B1Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the deviceNIKON CORP·Filed 2000·Granted Nov 20, 2001·15 cites·37 claims
- 4080US5689339AAlignment apparatusNIKON CORP·Filed 1995·Granted Nov 18, 1997·48 cites·18 claims
- 4180US5483311AProjection exposure apparatusNIKON CORP·Filed 1994·Granted Jan 9, 1996·29 cites·19 claims
- 4280US4739373AProjection exposure apparatusNIPPON KOGAKU KK·Filed 1986·Granted Apr 19, 1988·30 cites·9 claims
- 4378US8451424B2Exposure apparatus, method for producing device, and method for controlling exposure apparatusMAGOME NOBUTAKA·Filed 2006·Granted May 28, 2013·4 cites·51 claims
- 4477US10461039B2Mark, method for forming same, and exposure apparatusNIKON CORP·Filed 2019·Granted Oct 29, 2019·1 cites·16 claims
- 4577US10236259B2Mark, method for forming same, and exposure apparatusNIKON CORP·Filed 2018·Granted Mar 19, 2019·1 cites·17 claims
- 4677US5907405AAlignment method and exposure systemNIKON CORP·Filed 1997·Granted May 25, 1999·40 cites·20 claims
- 4775US6356343B1Mark for position detection and mark detecting method and apparatusNIKON CORP·Filed 1999·Granted Mar 12, 2002·30 cites·38 claims
- 4873US5801835ASurface position detection apparatus and methodNIKON CORP·Filed 1997·Granted Sep 1, 1998·25 cites·19 claims
- 4972US6650421B2Method and apparatus for inspecting optical deviceNIKON CORP·Filed 2001·Granted Nov 18, 2003·11 cites·26 claims
- 5071US5774240AExposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniquesNIKON CORP·Filed 1995·Granted Jun 30, 1998·29 cites·6 claims
Showing the top 50 of 93 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →