Inventor · disambiguated record
Norihiro Natsume
Also filed as: NATSUME NORIHIRO
6 granted patents·2 pending applications·40 citations·filing 2001–2013
76Inventor score
Top patents by PatentIndex Score
8 records- 0175US8697344B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternJSR CORP·Filed 2013·Granted Apr 15, 2014·2 cites·6 claims
- 0275US6623907B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Sep 23, 2003·35 cites·12 claims
- 0358US8497062B2Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation methodNATSUME NORIHIRO·Filed 2008·Granted Jul 30, 2013·1 cites·4 claims
- 0457US8431332B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternKOUNO DAITA·Filed 2008·Granted Apr 30, 2013·1 cites·6 claims
- 0556US8895229B2Composition for formation of upper layer film, and method for formation of photoresist patternNISHIMURA YUKIO·Filed 2007·Granted Nov 25, 2014·1 cites·5 claims
- 0645US2010167024A1Negative-tone radiation-sensitive composition, cured pattern forming method, and cured patternJSR CORP·Filed 2009·Application pending·0 cites
- 0740US7514205B2Composition for forming antireflection film, laminate, and method for forming resist patternJSR CORP·Filed 2006·Granted Apr 7, 2009·0 cites·12 claims
- 0835US2006223001A1Radiation-sensitive resin compositionNISHIMURA ISAO·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →