Inventor · disambiguated record
Nobutaka Sasaki
Also filed as: SASAKI NOBUTAKA
12 granted patents·9 pending applications·15 citations·filing 1998–2025
84Inventor score
Top patents by PatentIndex Score
21 records- 0191US12261028B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Mar 25, 2025·1 cites·12 claims
- 0286US12354849B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 8, 2025·1 cites·15 claims
- 0373US2025054793A1Substrate processing system and transfer methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0472US10264630B2Plasma processing apparatus and method for processing objectTOKYO ELECTRON LTD·Filed 2015·Granted Apr 16, 2019·2 cites·8 claims
- 0570US2025273444A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0669US10249478B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 2, 2019·2 cites·6 claims
- 0769US2025069862A1Substrate support and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0867US12165893B2Substrate processing system and transfer methodTOKYO ELECTRON LTD·Filed 2023·Granted Dec 10, 2024·0 cites·21 claims
- 0964US9818582B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Nov 14, 2017·1 cites·7 claims
- 1058US12469738B2Substrate support, plasma processing apparatus, and ring replacement methodTOKYO ELECTRON LTD·Filed 2022·Granted Nov 11, 2025·0 cites·20 claims
- 1158US12165854B2Substrate support and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 10, 2024·0 cites·19 claims
- 1256US12308221B2Substrate processing system and method for installing edge ringTOKYO ELECTRON LTD·Filed 2024·Granted May 20, 2025·0 cites·16 claims
- 1356US2025104979A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1455US12191119B2Substrate processing apparatus and gas switching method for substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 7, 2025·0 cites·16 claims
- 1554US2020098550A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1652US12027346B2Substrate processing apparatus and method of driving relay memberTOKYO ELECTRON LTD·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 1749US2025226189A1Substrate treatment systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1848US2025279264A1Substrate processing system and transfer methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1942US2015228462A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2039US2021027994A1Shutter mechanism and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2128US6233961B1Refrigerator and method of filling it with coolantDAIKIN IND LTD·Filed 1998·Granted May 22, 2001·8 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →