Inventor · disambiguated record
Nobuo Shimazu
Also filed as: SHIMAZU NOBUO
10 granted patents·1 pending application·262 citations·filing 1982–2001
91Inventor score
Top patents by PatentIndex Score
11 records- 0191US4980639AMethod and apparatus for testing integrated electronic deviceNIPPON TELEGRAPH & TELEPHONE·Filed 1988·Granted Dec 25, 1990·64 cites·6 claims
- 0287US5006795ACharged beam radiation apparatusNIPPON TELEPHONE AND TELEGRAPH·Filed 1986·Granted Apr 9, 1991·54 cites·23 claims
- 0382US4443703AMethod and apparatus of deflection calibration for a charged particle beam exposure apparatusNIPPON TELEGRAPH & TELEPHONE·Filed 1982·Granted Apr 17, 1984·23 cites·8 claims
- 0478US5041732ACharged particle beam generating apparatusNIPPON TELEGRAPH & TELEPHONE·Filed 1990·Granted Aug 20, 1991·33 cites·14 claims
- 0575US5097204AMethod and apparatus for evaluating the capacitance of an integrated electronic device using an e beamNIPPON TELEGRAPH & TELEPHONE·Filed 1990·Granted Mar 17, 1992·33 cites·6 claims
- 0673US4851768ACharacteristic test apparatus for electronic device and method for using the sameNIPPON TELEGRAPH & TELEPHONE·Filed 1988·Granted Jul 25, 1989·30 cites·25 claims
- 0766US6444374B1Manufacturing method of mask for electron beam proximity exposure and maskLEEPL CORPORATIN·Filed 2000·Granted Sep 3, 2002·10 cites·12 claims
- 0865US6727507B2Electron beam proximity exposure apparatus and methodLEEPL CORP·Filed 2001·Granted Apr 27, 2004·7 cites·5 claims
- 0961US6894295B2Electron beam proximity exposure apparatus and mask unit thereforLEEPL CORP·Filed 2000·Granted May 17, 2005·5 cites·7 claims
- 1050US6703623B1Electron beam proximity exposure apparatusLEEPL CORP·Filed 2000·Granted Mar 9, 2004·3 cites·29 claims
- 1133US2002070354A1Manufacturing method of mask for electron beam proximity exposure and maskFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →