Inventor · disambiguated record
Noel Smith
Also filed as: SMITH NOEL · SMITH NOEL S
20 granted patents·3 pending applications·326 citations·filing 2004–2017
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US7670455B2Magnetically enhanced, inductively coupled plasma source for a focused ion beam systemFEI CO·Filed 2007·Granted Mar 2, 2010·48 cites·30 claims
- 0296US7241361B2Magnetically enhanced, inductively coupled plasma source for a focused ion beam systemFEI CO·Filed 2004·Granted Jul 10, 2007·86 cites·20 claims
- 0395US8405054B2Multi-source plasma focused ion beam systemSMITH NOEL·Filed 2011·Granted Mar 26, 2013·27 cites·8 claims
- 0495US8168957B2Magnetically enhanced, inductively coupled plasma source for a focused ion beam systemKELLER JOHN·Filed 2010·Granted May 1, 2012·34 cites·22 claims
- 0595US8076650B2Multi-source plasma focused ion beam systemSMITH NOEL·Filed 2007·Granted Dec 13, 2011·44 cites·29 claims
- 0693US9401262B2Multi-source plasma focused ion beam systemFEI CO·Filed 2015·Granted Jul 26, 2016·4 cites·19 claims
- 0792US8087379B2Localized plasma processingCHANDLER CLIVE D·Filed 2005·Granted Jan 3, 2012·21 cites·28 claims
- 0891US9640367B2Plasma source for a focused ion beam systemFEI CO·Filed 2014·Granted May 2, 2017·9 cites·15 claims
- 0989US8829468B2Magnetically enhanced, inductively coupled plasma source for a focused ion beam systemKELLER JOHN·Filed 2012·Granted Sep 9, 2014·8 cites·19 claims
- 1089US8525419B2High voltage isolation and cooling for an inductively coupled plasma ion sourceSMITH NOEL S·Filed 2009·Granted Sep 3, 2013·25 cites·19 claims
- 1185US9029812B2Multi-source plasma focused ion beam systemFEI CO·Filed 2014·Granted May 12, 2015·4 cites·15 claims
- 1279US10128076B1Inductively coupled plasma ion source with tunable radio frequency powerOREGON PHYSICS LLC·Filed 2017·Granted Nov 13, 2018·3 cites·12 claims
- 1377US8692217B2Multi-source plasma focused ion beam systemFEI CO·Filed 2013·Granted Apr 8, 2014·2 cites·10 claims
- 1473US8835880B2Charged particle-beam processing using a cluster sourceCHANDLER CLIVE·Filed 2006·Granted Sep 16, 2014·5 cites·28 claims
- 1569US8303833B2High resolution plasma etchTOTH MILOS·Filed 2007·Granted Nov 6, 2012·3 cites·22 claims
- 1667US9655223B2RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion sourceOREGON PHYSICS LLC·Filed 2013·Granted May 16, 2017·3 cites·11 claims
- 1753US9053895B2System for attachment of an electrode into a plasma sourceKELLOGG SEAN·Filed 2011·Granted Jun 9, 2015·0 cites·22 claims
- 1853US2015079796A1Charged-Particle-Beam Processing Using a Cluster SourceFEI CO·Filed 2014·Application pending·0 cites
- 1952US9530625B2Method for attachment of an electrode into an inductively-coupled plasmaFEI CO·Filed 2015·Granted Dec 27, 2016·0 cites·16 claims
- 2050US2013192758A1High Resolution Plasma EtchFEI CO·Filed 2012·Application pending·0 cites
- 2149US8530006B2Localized plasma processingCHANDLER CLIVE D·Filed 2010·Granted Sep 10, 2013·0 cites·25 claims
- 2246US2011163068A1Multibeam SystemUTLAUT MARK·Filed 2009·Application pending·0 cites
- 2342US9196451B2Plasma source for charged particle beam systemZHANG SHOUYIN·Filed 2012·Granted Nov 24, 2015·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →