Inventor · disambiguated record
Noriaki Tochizawa
Also filed as: TOCHIZAWA NORIAKI
12 granted patents·75 citations·filing 1989–2002
90Inventor score
Top patents by PatentIndex Score
12 records- 0168US6342330B2Photosensitive compositions and pattern formation methodTOYO GOSEI KOGYO KK·Filed 2001·Granted Jan 29, 2002·8 cites·8 claims
- 0259US6444391B2Photosensitive compositions and pattern formation methodTOYO GOSEI KOGYO KK·Filed 2001·Granted Sep 3, 2002·4 cites·7 claims
- 0358US5041570APhotosensitive 4,4'-diazidostilbene derivativeTOYO GOSEI KOGYO KK·Filed 1989·Granted Aug 20, 1991·12 cites·5 claims
- 0453US5021505APhotosensitive poly(vinyl alcohol) derivativeAGENCY IND SCIENCE TECHN·Filed 1989·Granted Jun 4, 1991·8 cites·5 claims
- 0545US6020093APhotosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositionsTOYO GOSEI KOGYO LTD·Filed 1998·Granted Feb 1, 2000·14 cites·19 claims
- 0644US5866296APhotosensitive resin compositionTOYO GOSEI CO LTD·Filed 1997·Granted Feb 2, 1999·9 cites·10 claims
- 0739US5807657APolyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the sameTOYO GOSEI KOGYO KK·Filed 1996·Granted Sep 15, 1998·5 cites·8 claims
- 0837US6140007APhotosensitive compositions and pattern formation methodTOYO GOSEI KOGYO KK·Filed 1998·Granted Oct 31, 2000·5 cites·15 claims
- 0934US6797452B2Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the compositionTOYO GOSEI KOGYO KK·Filed 2002·Granted Sep 28, 2004·2 cites·10 claims
- 1033US5430130APhotosensitive polyfunctional aromatic diazo compounds useful in photosensitive compositionsTOYO GOSEI KOGYO KK·Filed 1993·Granted Jul 4, 1995·4 cites·1 claims
- 1128US5589315APhotosensitive compositions comprising photosensitive polyfunctional aromatic diazo compounds, and presensitized lithographic plates formed with the sameTOYO GOSEI KOGYO KK·Filed 1995·Granted Dec 31, 1996·2 cites·4 claims
- 1224US6140018APhotosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation methodTOYO GOSEI KOGYO KK·Filed 1999·Granted Oct 31, 2000·2 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Noriaki Tochizawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →