Photosensitive compositions and pattern formation method

Abstract

Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

What is claimed is: 
     
       1. A photosensitive composition characterized by containing a water-soluble azide compound serving as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound. 
     
     
       2. A photosensitive composition according to claim 1, which further contains another water-soluble polymer that is photocrosslinkable in the presence of the above-described water-soluble azide compound. 
     
     
       3. A photosensitive composition according to claim 2, wherein said another water-soluble polymer comprises at least one species selected from the group consisting of polyvinylpyrrolidone, acrylamide-diacetoneacrylamide copolymers, poly(N,N-dimethylacrylamide), and N,N-dimethylacrylamide-acrylamide copolymers. 
     
     
       4. A photosensitive composition according to any one of claims 1 through 3, which further contains additives and at least one species of water-soluble polymers. 
     
     
       5. A pattern formation method characterized by comprising a coating film formation step in which a photosensitive composition containing a water-soluble azide compound serving as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound is applied onto a substrate to thereby form a coating film of the photosensitive composition; an exposure step in which the coating film of the photosensitive composition is irradiated for a desired pattern; and a development step in which the patternwise exposed coating film is developed with water or an aqueous developer. 
     
     
       6. A pattern formation method according to claim 5, wherein the photosensitive composition further contains another water-soluble polymer that is photocrosslinkable in the presence of the above-described water-soluble azide compound. 
     
     
       7. A pattern formation method according to claim 6, wherein said another water-soluble polymer comprises at least one species selected from the group consisting of polyvinylpyrrolidone, acrylamide-diacetoneacrylamide copolymers, poly(N,N-dimethylacrylamide), and N,N-dimethylacrylamide-acrylamide copolymers. 
     
     
       8. A pattern formation method according to claim 5, wherein the photosensitive composition further contains additives and at least one species of water-soluble polymers. 
     
     
       9. A pattern formation method according to any one of claims 5 through 8, wherein the substrate is the inner surface of the face plate of a color cathode-ray tube. 
     
     
       10. A photosensitive composition for the formation of a black matrix, which composition is used for the formation of a black matrix of color cathode-ray tubes and which contains a water-soluble azide compound serving as a photocrosslinking agent and a water-soluble polymer which is photocrosslinkable in the presence of the water-soluble azide compound, wherein the photocrosslinkable water-soluble polymer predominantly contains poly(N-vinylformamide) and further contains another water-soluble polymer having reciprocity-law failure characteristics more prominent than those of the corresponding poly(N-vinylformamide). 
     
     
       11. A photosensitive composition according to claim 10, wherein said another water-soluble polymer comprises at least one species selected from the group consisting of polyvinylpyrrolidone, acrylamide-diacetoneacrylamide copolymers, poly(N,N-dimethylacrylamide), and N,N-dimethylacrylamide-acrylamide copolymers. 
     
     
       12. A photosensitive composition for the formation of a phosphor pattern, which composition contains a water-soluble azide compound serving as a photocrosslinking agent; a water-soluble polymer which is photocrosslinkable in the presence of the water-soluble azide compound; and a phosphor; and which is prepared by dissolving or dispersing these in an aqueous medium, wherein the photocrosslinkable water-soluble polymer contains poly(N-vinylformamide). 
     
     
       13. A photosensitive composition for the formation of a phosphor pattern according to claim 12, which further contains at least one species selected from among saponified products of polyvinyl acetate or acrylic emulsions. 
     
     
       14. A photosensitive composition for the formation of a color filter, which composition contains a water-soluble azide compound serving as a photocrosslinking agent; a water-soluble polymer which is photocrosslinkable in the presence of the water-soluble azide compound, and a pigment; and which is prepared by dissolving or dispersing these in an aqueous medium, wherein the photocrosslinkable water-soluble polymer contains poly(N-vinylformamide). 
     
     
       15. A photosensitive composition for the formation of a color filter according to claim 14, which further contains at least one species selected from among saponified products of polyvinyl acetate or acrylic emulsions.