Inventor · disambiguated record
Olivier Luere
Also filed as: LUERE OLIVIER
36 granted patents·8 pending applications·916 citations·filing 2013–2024
98Inventor score
Top patents by PatentIndex Score
44 records- 0199US10312048B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·48 cites·19 claims
- 0299US9269590B2Spacer formationAPPLIED MATERIALS INC·Filed 2014·Granted Feb 23, 2016·195 cites·15 claims
- 0398US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0498US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0598US11728124B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·5 cites·13 claims
- 0698US11699572B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·8 cites·30 claims
- 0798US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 0898US11284500B2Method of controlling ion energy distribution using a pulse generatorAPPLIED MATERIALS INC·Filed 2020·Granted Mar 22, 2022·21 cites·20 claims
- 0998US11069504B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2020·Granted Jul 20, 2021·7 cites·21 claims
- 1098US10923321B2Apparatus and method of generating a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 16, 2021·52 cites·25 claims
- 1198US10916408B2Apparatus and method of forming plasma using a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 9, 2021·54 cites·26 claims
- 1298US10791617B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 29, 2020·62 cites·20 claims
- 1398US10685807B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2019·Granted Jun 16, 2020·38 cites·16 claims
- 1498US10555412B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·67 cites·32 claims
- 1598US10448495B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·63 cites·15 claims
- 1698US10448494B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·68 cites·30 claims
- 1798US10103010B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Oct 16, 2018·34 cites·10 claims
- 1898US9947517B1Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·48 cites·20 claims
- 1997US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 2097US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 2196US10991556B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·11 cites·20 claims
- 2296US10553404B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·13 cites·20 claims
- 2396US10504702B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·14 cites·20 claims
- 2495USD797691SComposite edge ringAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·59 cites·1 claims
- 2593US11393710B2Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2017·Granted Jul 19, 2022·9 cites·15 claims
- 2691US12094752B2Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2022·Granted Sep 17, 2024·1 cites·10 claims
- 2787US2024395502A1Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2886US11508554B2High voltage filter assemblyAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·4 cites·16 claims
- 2984US12057292B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
- 3081US9520302B2Methods for controlling Fin recess loadingAPPLIED MATERIALS INC·Filed 2015·Granted Dec 13, 2016·3 cites·19 claims
- 3176US2024429088A1Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3262US11482402B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Granted Oct 25, 2022·0 cites·20 claims
- 3359US9281190B2Local and global reduction of critical dimension (CD) asymmetry in etch processingCHIANG KANG-LIE·Filed 2014·Granted Mar 8, 2016·1 cites·8 claims
- 3456US2023352264A1Creating Ion Energy Distribution Functions (IEDF)DORF LEONID·Filed 2023·Application pending·0 cites
- 3554US10109464B2Minimization of ring erosion during plasma processesAPPLIED MATERIALS INC·Filed 2016·Granted Oct 23, 2018·0 cites·19 claims
- 3654US2019043697A1Minimization of ring erosion during plasma processesAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3753US12456611B2Systems and methods for controlling a voltage waveform at a substrate during plasma processingAPPLIED MATERIALS INC·Filed 2017·Granted Oct 28, 2025·0 cites·13 claims
- 3853US12278110B2Bias voltage modulation approach for SiO/SiN layer alternating etch processAPPLIED MATERIALS INC·Filed 2022·Granted Apr 15, 2025·0 cites·21 claims
- 3950US11521849B2In-situ deposition processAPPLIED MATERIALS INC·Filed 2019·Granted Dec 6, 2022·0 cites·16 claims
- 4044US2015214066A1Method for material removal in dry etch reactorAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4144US2020373149A1In-situ atomic layer deposition processAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4243US2019228952A1Processing with powered edge ringAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4343US2014335695A1External uv light sources to minimize asymmetric resist pattern trimming rate for three dimensional semiconductor chip manufactureAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4440US11049760B2Universal process kitAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →