Inventor · disambiguated record
Oliver Natt
Also filed as: NATT OLIVER
14 granted patents·2 pending applications·34 citations·filing 2007–2019
89Inventor score
Top patents by PatentIndex Score
16 records- 0193US9703206B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 11, 2017·4 cites·30 claims
- 0292US8467033B2Method for operating an illumination system of a microlithographic projection exposure apparatusNATT OLIVER·Filed 2010·Granted Jun 18, 2013·12 cites·38 claims
- 0391US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0490US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0587US9341957B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 17, 2016·2 cites·30 claims
- 0683US9217931B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·2 cites·31 claims
- 0768US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 0867US2019155166A1Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Application pending·0 cites
- 0964US10222704B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Mar 5, 2019·0 cites·27 claims
- 1063US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 1158US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 1252US8169594B2Illumination system of a microlithographic projection exposure apparatusDIECKMANN NILS·Filed 2009·Granted May 1, 2012·0 cites·29 claims
- 1350US9116441B2Illumination system of a microlithographic projection exposure apparatusDIECKMANN NILS·Filed 2012·Granted Aug 25, 2015·0 cites·20 claims
- 1444US9298097B2Projection exposure apparatus for EUV microlithography and method for microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Mar 29, 2016·0 cites·24 claims
- 1536US2008079939A1Instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatusCARL ZESS SMT AG·Filed 2007·Application pending·0 cites
- 1633US9568845B2Mirror for use in a microlithography projection exposure apparatusROCKTAESCHEL MARTIN·Filed 2012·Granted Feb 14, 2017·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →