Inventor · disambiguated record
Olaf Rogalsky
Also filed as: ROGALSKY OLAF
8 granted patents·2 pending applications·15 citations·filing 2005–2024
80Inventor score
Top patents by PatentIndex Score
10 records- 0188US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 0279US9494868B2Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2013·Granted Nov 15, 2016·2 cites·34 claims
- 0374US8605253B2Lithographic projection objectiveROGALSKY OLAF·Filed 2008·Granted Dec 10, 2013·4 cites·46 claims
- 0465US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 0563US2025208398A1Magnifying imaging optical unit for a metrology system for examining objectsZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0661US2019025709A1Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 0758US10042265B2Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2016·Granted Aug 7, 2018·0 cites·11 claims
- 0858US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 0955US11256182B2Process for cleaning optical elements for the ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2019·Granted Feb 22, 2022·0 cites·16 claims
- 1045US10754132B2Imaging optical system for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 25, 2020·0 cites·31 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →