Inventor · disambiguated record
Osamu Komuro
Also filed as: KOMURO OSAMU
41 granted patents·3 pending applications·426 citations·filing 2000–2019
98Inventor score
Top patents by PatentIndex Score
44 records- 0197US8304725B2Charged particle beam systemKOMURO OSAMU·Filed 2010·Granted Nov 6, 2012·111 cites·9 claims
- 0293US7230723B2High-accuracy pattern shape evaluating method and apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Jun 12, 2007·20 cites·7 claims
- 0392US6627888B2Scanning electron microscopeHITACHI LTD·Filed 2001·Granted Sep 30, 2003·30 cites·9 claims
- 0491US6909930B2Method and system for monitoring a semiconductor device manufacturing processHITACHI LTD·Filed 2002·Granted Jun 21, 2005·52 cites·37 claims
- 0590US7369703B2Method and apparatus for circuit pattern inspectionHITACHI LTD·Filed 2006·Granted May 6, 2008·10 cites·22 claims
- 0689US8304724B2Microstructured pattern inspection methodSASAJIMA FUMIHIRO·Filed 2010·Granted Nov 6, 2012·5 cites·8 claims
- 0789US7435959B2Microstructured pattern inspection methodHITACHI LTD·Filed 2007·Granted Oct 14, 2008·7 cites·20 claims
- 0889US7217923B2Microstructured pattern inspection methodHITACHI LTD·Filed 2005·Granted May 15, 2007·7 cites·11 claims
- 0988US7791021B2Microstructured pattern inspection methodHITACHI LTD·Filed 2008·Granted Sep 7, 2010·6 cites·15 claims
- 1088US7619751B2High-accuracy pattern shape evaluating method and apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 17, 2009·9 cites·20 claims
- 1186US7095884B2Method and apparatus for circuit pattern inspectionHITACHI LTD·Filed 2002·Granted Aug 22, 2006·22 cites·6 claims
- 1285US6913861B2Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·24 cites·18 claims
- 1381US7405835B2High-accuracy pattern shape evaluating method and apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Jul 29, 2008·5 cites·18 claims
- 1481US7180062B2Pattern measuring methodHITACHI HIGH TECH CORP·Filed 2005·Granted Feb 20, 2007·5 cites·5 claims
- 1579US9202665B2Charged particle beam apparatus for removing charges developed on a region of a sampleMATSUI HIROYUKI·Filed 2011·Granted Dec 1, 2015·5 cites·17 claims
- 1678US8704175B2Scanning electron microscopeSOHDA YASUNARI·Filed 2011·Granted Apr 22, 2014·4 cites·14 claims
- 1778US7214937B2Electron microscopeHITACHI LTD·Filed 2005·Granted May 8, 2007·6 cites·7 claims
- 1877US7851754B2Charged particle beam systemHITACHI HIGH TECH CORP·Filed 2007·Granted Dec 14, 2010·3 cites·18 claims
- 1977US7439505B2Scanning electron microscopeHITACHI LTD·Filed 2005·Granted Oct 21, 2008·2 cites·7 claims
- 2077US6765204B2Microstructured pattern inspection methodHITACHI LTD·Filed 2003·Granted Jul 20, 2004·7 cites·12 claims
- 2176US7166840B2Method for determining depression/protrusion of sample and charged particle beam apparatus thereforHITACHI LTD·Filed 2005·Granted Jan 23, 2007·3 cites·4 claims
- 2276US6872943B2Method for determining depression/protrusion of sample and charged particle beam apparatus thereforHITACHI LTD·Filed 2002·Granted Mar 29, 2005·10 cites·18 claims
- 2375US10840060B2Scanning electron microscope and sample observation methodHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 17, 2020·1 cites·16 claims
- 2475US9702695B2Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereofKAWADA HIROKI·Filed 2011·Granted Jul 11, 2017·5 cites·7 claims
- 2575US9129353B2Charged particle beam device, and image analysis deviceSHIRAI MASUMI·Filed 2012·Granted Sep 8, 2015·5 cites·9 claims
- 2675US6573499B1Microstructured pattern inspection methodHITACHI LTD·Filed 2000·Granted Jun 3, 2003·12 cites·11 claims
- 2772US7288764B2Pattern measuring methodHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 30, 2007·2 cites·10 claims
- 2871US9991092B2Scanning electron microscope and sample observation methodCHENG ZHAOHUI·Filed 2010·Granted Jun 5, 2018·3 cites·37 claims
- 2971US6791082B2Process conditions change monitoring systems that use electron beams, and related monitoring methodsHITACHI LTD·Filed 2003·Granted Sep 14, 2004·11 cites·4 claims
- 3070US10545017B2Overlay error measuring device and computer program for causing computer to measure patternHITACHI HIGH TECH CORP·Filed 2013·Granted Jan 28, 2020·2 cites·14 claims
- 3164US8285056B2Method and apparatus for computing degree of matchingTAGUCHI JUNICHI·Filed 2009·Granted Oct 9, 2012·6 cites·21 claims
- 3263US6803573B2Scanning electron microscopeHITACHI LTD·Filed 2003·Granted Oct 12, 2004·6 cites·6 claims
- 3362US8953855B2Edge detection technique and charged particle radiation equipmentNAMAI HITOSHI·Filed 2009·Granted Feb 10, 2015·6 cites·8 claims
- 3461US6791096B2Process conditions change monitoring systems that use electron beams, and related monitoring methodsHITACHI LTD·Filed 2002·Granted Sep 14, 2004·6 cites·6 claims
- 3559US6936819B2Microstructured pattern inspection methodHITACHI LTD·Filed 2004·Granted Aug 30, 2005·4 cites·31 claims
- 3658US8666165B2Scanning electron microscopeYAMAGUCHI SATORU·Filed 2008·Granted Mar 4, 2014·1 cites·6 claims
- 3756US9275829B2Image forming device and computer programSETOGUCHI KATSUMI·Filed 2011·Granted Mar 1, 2016·1 cites·10 claims
- 3852US9443695B2Charged-particle beam deviceHITACHI HIGH TECH CORP·Filed 2013·Granted Sep 13, 2016·0 cites·11 claims
- 3952US7002151B2Scanning electron microscopeHITACHI LTD·Filed 2004·Granted Feb 21, 2006·2 cites·12 claims
- 4052US2012305764A1Method of determining the concavity and convexity on sample surface, and charged particle beam apparatusKIMURA YOSHIHIRO·Filed 2012·Application pending·0 cites
- 4147US11690208B2Electromagnetic field shielding plate, method for manufacturing same, electromagnetic field shielding structure, and semiconductor manufacturing environmentHITACHI HIGH TECH CORP·Filed 2019·Granted Jun 27, 2023·0 cites·27 claims
- 4244US2004222375A1Method of determining the concavity and convexity on sample surface, and charged particle beam apparatusFiled 2004·Application pending·0 cites
- 4342US7941008B2Pattern search methodHITACHI HIGH TECH CORP·Filed 2005·Granted May 10, 2011·0 cites·17 claims
- 4441US2002024012A1Electron microscopeFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Osamu Komuro files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →