Inventor · disambiguated record
Pawitter Mangat
Also filed as: MANGAT PAWITTER · MANGAT PAWITTER J S · MANGAT PAWITTER JIT SINGH
22 granted patents·416 citations·filing 1997–2013
96Inventor score
Top patents by PatentIndex Score
22 records- 0192US6352803B1Coatings on reflective mask substratesUNIV CALIFORNIA·Filed 2000·Granted Mar 5, 2002·69 cites·20 claims
- 0291US8739098B1EUV mask defect reconstruction and compensation repairGLOBALFOUNDRIES INC·Filed 2013·Granted May 27, 2014·9 cites·20 claims
- 0383US5989760AMethod of processing a substrate utilizing specific chuckMOTOROLA INC·Filed 1998·Granted Nov 23, 1999·41 cites·20 claims
- 0482US6986971B2Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the sameFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Jan 17, 2006·23 cites·29 claims
- 0580US6477898B1Membrane mask stress measurement apparatus and method thereforMOTOROLA INC·Filed 2000·Granted Nov 12, 2002·22 cites·34 claims
- 0679US6653053B2Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective maskMOTOROLA INC·Filed 2001·Granted Nov 25, 2003·21 cites·12 claims
- 0777US6297169B1Method for forming a semiconductor device using a mask having a self-assembled monolayerMOTOROLA INC·Filed 1998·Granted Oct 2, 2001·39 cites·21 claims
- 0875US6673520B2Method of making an integrated circuit using a reflective maskMOTOROLA INC·Filed 2001·Granted Jan 6, 2004·15 cites·20 claims
- 0975US5942760AMethod of forming a semiconductor device utilizing scalpel mask, and mask thereforMOTOROLA INC·Filed 1997·Granted Aug 24, 1999·28 cites·25 claims
- 1068US6749968B2Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the sameFREESCALE SEMICONDUCTOR INC·Filed 2001·Granted Jun 15, 2004·10 cites·27 claims
- 1168US6596465B1Method of manufacturing a semiconductor componentMOTOROLA INC·Filed 1999·Granted Jul 22, 2003·47 cites·18 claims
- 1264US6986974B2Attenuated phase shift mask for extreme ultraviolet lithography and method thereforeFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Jan 17, 2006·11 cites·29 claims
- 1363US7378197B2Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARCFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted May 27, 2008·1 cites·19 claims
- 1459US6939650B2Method of patterning photoresist on a wafer using a transmission mask with a carbon layerFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Sep 6, 2005·5 cites·29 claims
- 1559US5899728AMethod of forming a lithographic maskMOTOROLA INC·Filed 1997·Granted May 4, 1999·24 cites·35 claims
- 1658US6221537B1Method of forming mask with angled struts of reduced heightMOTOROLA INC·Filed 1997·Granted Apr 24, 2001·18 cites·32 claims
- 1757US7026076B2Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARCFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Apr 11, 2006·4 cites·11 claims
- 1854US6124063AMethod of forming a semiconductor device utilizing lithographic mask and mask thereforMOTOROLA INC·Filed 1998·Granted Sep 26, 2000·18 cites·34 claims
- 1952US6797440B2Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor deviceFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·3 cites·22 claims
- 2050US6875546B2Method of patterning photoresist on a wafer using an attenuated phase shift maskFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Apr 5, 2005·2 cites·30 claims
- 2132US6177354B1Method of etching a substrateMOTOROLA INC·Filed 1999·Granted Jan 23, 2001·3 cites·13 claims
- 2231US6039835AEtching apparatus and method of etching a substrateMOTOROLA INC·Filed 1997·Granted Mar 21, 2000·3 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →