Inventor · disambiguated record
Paul Moroz
Also filed as: MOROZ PAUL
11 granted patents·13 pending applications·196 citations·filing 2002–2021
91Inventor score
Top patents by PatentIndex Score
24 records- 0191US7141763B2Method and apparatus for rapid temperature change and controlTOKYO ELECTRON LTD·Filed 2004·Granted Nov 28, 2006·70 cites·42 claims
- 0289US7998307B2Electron beam enhanced surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2006·Granted Aug 16, 2011·14 cites·19 claims
- 0388US7938081B2Radial line slot antenna having a conductive layerTOKYO ELECTRON LTD·Filed 2006·Granted May 10, 2011·12 cites·19 claims
- 0487US6868800B2Branching RF antennas and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 22, 2005·30 cites·31 claims
- 0586US6887341B2Plasma processing apparatus for spatial control of dissociation and ionizationTOKYO ELECTRON LTD·Filed 2002·Granted May 3, 2005·25 cites·13 claims
- 0684US7199327B2Method and system for arc suppression in a plasma processing systemTOKYO ELECTRON LTD·Filed 2003·Granted Apr 3, 2007·22 cites·64 claims
- 0771US6674241B2Plasma processing apparatus and method of controlling chemistryTOKYO ELECTRON LTD·Filed 2002·Granted Jan 6, 2004·9 cites·44 claims
- 0863US7073383B2Apparatus and method for determining clamping status of semiconductor waferTOKYO ELECTRON LTD·Filed 2002·Granted Jul 11, 2006·9 cites·39 claims
- 0954US2007113976A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1054US2007114206A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1154US2007131650A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1253US7109122B2Method and apparatus for reducing substrate charging damageTOKYO ELECTRON LTD·Filed 2003·Granted Sep 19, 2006·2 cites·70 claims
- 1353US2009095451A1Method and apparatus for temperature change and controlTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1452US7186313B2Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2004·Granted Mar 6, 2007·2 cites·13 claims
- 1548US2010307684A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1646US6992892B2Method and apparatus for efficient temperature control using a contact volumeTOKYO ELECTRON LTD·Filed 2003·Granted Jan 31, 2006·1 cites·24 claims
- 1746US2006060303A1Plasma processing system and methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1842US2006027169A1Method and system for substrate temperature profile controlTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1941US2006259198A1Intelligent system for detection of process status, process fault and preventive maintenanceTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2041US2005229854A1Method and apparatus for temperature change and controlTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2140US2023140563A1System and method for thermoelectric charging of a batteryMOROZ TECH PTY LTD·Filed 2021·Application pending·0 cites
- 2237US2004194890A1Hybrid plasma processing apparatusTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 2336US2007074811A1Method and apparatus for measuring plasma density in processing reactors using a long dielectric tubeMOROZ PAUL·Filed 2005·Application pending·0 cites
- 2435US2007075036A1Method and apparatus for measuring plasma density in processing reactors using a short dielectric capMOROZ PAUL·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →