Inventor · disambiguated record
Paul Scullin
Also filed as: SCULLIN PAUL
4 granted patents·8 pending applications·4 citations·filing 2005–2025
63Inventor score
Top patents by PatentIndex Score
12 records- 0189US11908668B2Apparatus for ion energy analysis of plasma processesIMPEDANS LTD·Filed 2021·Granted Feb 20, 2024·3 cites·18 claims
- 0274US2025362656A1Controller for a matching unit of a plasma processing systemAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0372US2025054740A1Apparatus for ion energy analysis of plasma processesIMPEDANS LTD·Filed 2024·Application pending·0 cites
- 0466US12399474B2Controller for a matching unit of a plasma processing systemIMPEDANS LTD·Filed 2022·Granted Aug 26, 2025·0 cites·15 claims
- 0565US12136542B2Apparatus for ion energy analysis of plasma processesIMPEDANS LTD·Filed 2022·Granted Nov 5, 2024·0 cites·30 claims
- 0653US2024177965A1Shielded apparatus for ion energy analysis of plasma processesIMPEDANS LTD·Filed 2023·Application pending·0 cites
- 0751US9263236B2Sensing of plasma process parametersSCULLIN PAUL·Filed 2011·Granted Feb 16, 2016·1 cites·12 claims
- 0846US2023305045A1System and method for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamberIMPEDANS LTD·Filed 2023·Application pending·0 cites
- 0945US2022196558A1Apparatus and method for sensing rf signals from rf plasma processing equipmentIMPEDANS LTD·Filed 2021·Application pending·0 cites
- 1040US2005212450A1Method and system for detecting electrical arcing in a plasma process powered by an AC sourceSCIENT SYSTEMS RES LTD·Filed 2005·Application pending·0 cites
- 1136US2015276833A1Analysing rf signals from a plasma systemIMPEDANS LTD·Filed 2013·Application pending·0 cites
- 1232US2012232817A1Sensor for measuring plasma parametersO'SULLIVAN DONAL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →