Inventor · disambiguated record

Patrica Vasquez

Also filed as: VASQUEZ PATRICA

1 granted patent·69 citations·filing 1991–1991

51Inventor score

Technology areasH10P

Files withAPPLIED MATERIALS INC1

Top patents by PatentIndex Score

1 record

0174US5160407ALow pressure anisotropic etch process for tantalum silicide or titanium silicide layer formed over polysilicon layer deposited on silicon oxide layer on semiconductor waferAPPLIED MATERIALS INC·Filed 1991·Granted Nov 3, 1992·69 cites·9 claims

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