Inventor · disambiguated record
Paul J. Yancey
Also filed as: YANCEY PAUL J
11 granted patents·1 pending application·231 citations·filing 1978–2002
92Inventor score
Top patents by PatentIndex Score
12 records- 0190US6428586B1Method of manufacturing a polymer or polymer/composite polishing padRODEL INC·Filed 2000·Granted Aug 6, 2002·57 cites·22 claims
- 0281US6365520B1Small particle size chemical mechanical polishing compositionRODEL INC·Filed 2000·Granted Apr 2, 2002·24 cites·9 claims
- 0379US4242842APrecision polishing suspension and method for making sameBAIKOWSKI P SYNTH SA·Filed 1979·Granted Jan 6, 1981·34 cites·17 claims
- 0472US6143662AChemical mechanical polishing composition and method of polishing a substrateRODEL INC·Filed 1999·Granted Nov 7, 2000·36 cites·9 claims
- 0571US4269652AMethod for growing crystalline materialsALLIED CHEM·Filed 1978·Granted May 26, 1981·18 cites·11 claims
- 0670US6413288B2CMP polishing slurry dewatering and reconstitutionRODEL INC·Filed 2001·Granted Jul 2, 2002·9 cites·8 claims
- 0770US4353875AApparatus for growing crystalline materialsALLIED CORP·Filed 1980·Granted Oct 12, 1982·16 cites·1 claims
- 0866US6241586B1CMP polishing slurry dewatering and reconstitutionRODEL INC·Filed 1999·Granted Jun 5, 2001·22 cites·8 claims
- 0963US6447375B2Polishing method using a reconstituted dry particulate polishing compositionRODEL INC·Filed 2001·Granted Sep 10, 2002·9 cites·22 claims
- 1053US6572449B2Dewatered CMP polishing compositions and methods for using sameRODEL INC·Filed 2001·Granted Jun 3, 2003·4 cites·7 claims
- 1151US6464741B2CMP polishing slurry dewatering and reconstitutionRODEL INC·Filed 2002·Granted Oct 15, 2002·2 cites·6 claims
- 1240US2001044260A1CMP polishing slurry dewatering and reconstitutionFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →