Inventor · disambiguated record
Peter Hsieh
Also filed as: HSIEH PETER · HSIEH PETER CHANG-LIN
6 granted patents·1 pending application·1,445 citations·filing 1994–2004
90Inventor score
Technology areasH10P
Top patents by PatentIndex Score
7 records- 0198US6080529AMethod of etching patterned layers useful as masking during subsequent etching or for damascene structuresAPPLIED MATERIALS INC·Filed 1998·Granted Jun 27, 2000·551 cites·9 claims
- 0296US6458516B1Method of etching dielectric layers using a removable hardmaskAPPLIED MATERIALS INC·Filed 2000·Granted Oct 1, 2002·113 cites·23 claims
- 0396US6331380B1Method of pattern etching a low K dielectric layerAPPLIED MATERIALS INC·Filed 2000·Granted Dec 18, 2001·159 cites·44 claims
- 0495US6352081B1Method of cleaning a semiconductor device processing chamber after a copper etch processAPPLIED MATERIALS INC·Filed 1999·Granted Mar 5, 2002·252 cites·15 claims
- 0595US6143476AMethod for high temperature etching of patterned layers using an organic mask stackAPPLIED MATERIALS INC·Filed 1997·Granted Nov 7, 2000·186 cites·37 claims
- 0691US5545289APassivating, stripping and corrosion inhibition of semiconductor substratesAPPLIED MATERIALS INC·Filed 1994·Granted Aug 13, 1996·184 cites·91 claims
- 0733US2006102197A1Post-etch treatment to remove residuesCHIANG KANG-LIE·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →