Inventor · disambiguated record
Peter F. Kurunczi
Also filed as: KURUNCZI PETER · KURUNCZI PETER F · KURUNCZI PETER FRANK
47 granted patents·16 pending applications·258 citations·filing 2001–2024
98Inventor score
Files withAPPLIED MATERIALS INC18VARIAN SEMICONDUCTOR EQUIPMENT ASS INC17VARIAN SEMICONDUCTOR EQUIPMENT13CERIONX INC8KURUNCZI PETER F2
Top patents by PatentIndex Score
63 records- 0195US12106936B2Scanned angled etching apparatus and techniques providing separate co-linear radicals and ionsAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·2 cites·20 claims
- 0294US11388810B2System, apparatus and method for multi-frequency resonator operation in linear acceleratorAPPLIED MATERIALS INC·Filed 2020·Granted Jul 12, 2022·4 cites·18 claims
- 0392US10192727B2Electrodynamic mass analysisVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 29, 2019·8 cites·19 claims
- 0490US11587778B2Electrodynamic mass analysis with RF biased ion sourceAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·2 cites·16 claims
- 0590US7459704B2Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atomsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Dec 2, 2008·17 cites·36 claims
- 0689US11069511B2System and methods using an inline surface engineering sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jul 20, 2021·4 cites·6 claims
- 0789US7094314B2Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray headsCERIONX INC·Filed 2004·Granted Aug 22, 2006·47 cites·13 claims
- 0888US12249488B2Plasma shaper to control ion flux distribution of plasma sourceAPPLIED MATERIALS INC·Filed 2022·Granted Mar 11, 2025·1 cites·10 claims
- 0988US11662524B2Forming variable depth structures with laser ablationAPPLIED MATERIALS INC·Filed 2020·Granted May 30, 2023·2 cites·12 claims
- 1088US9530615B2Techniques for improving the performance and extending the lifetime of an ion sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Dec 27, 2016·9 cites·20 claims
- 1188US9514912B2Control of ion angular distribution of ion beams with hidden deflection electrodeVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Dec 6, 2016·9 cites·20 claims
- 1288US7017594B2Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray headsCERIONX INC·Filed 2005·Granted Mar 28, 2006·23 cites·25 claims
- 1387US8471476B2Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangementKURUNCZI PETER F·Filed 2010·Granted Jun 25, 2013·10 cites·23 claims
- 1486US11715621B2Scanned angled etching apparatus and techniques providing separate co-linear radicals and ionsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 1, 2023·3 cites·20 claims
- 1586US9865430B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 9, 2018·3 cites·12 claims
- 1686US9288889B2Apparatus and techniques for energetic neutral beam processingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 15, 2016·7 cites·19 claims
- 1786US7367344B2Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray headsCERIONX INC·Filed 2005·Granted May 6, 2008·16 cites·25 claims
- 1885US8366871B2Method and apparatus for cleaning and surface conditioning objects using plasmaIONFIELD HOLDINGS LLC·Filed 2006·Granted Feb 5, 2013·11 cites·14 claims
- 1984US10522330B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Dec 31, 2019·3 cites·8 claims
- 2083US7812321B2Techniques for providing a multimode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 12, 2010·9 cites·12 claims
- 2182US8461554B1Apparatus and method for charge neutralization during processing of a workpieceKURUNCZI PETER F·Filed 2011·Granted Jun 11, 2013·6 cites·19 claims
- 2282US8092643B2Method and apparatus for cleaning and surface conditioning objects using plasmaKURUNCZI PETER FRANK·Filed 2005·Granted Jan 10, 2012·9 cites·19 claims
- 2381US10224181B2Radio frequency extraction system for charge neutralized ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Mar 5, 2019·3 cites·13 claims
- 2480US7767986B2Method and apparatus for controlling beam current uniformity in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Aug 3, 2010·5 cites·19 claims
- 2580US2024297016A1Apparatus and techniques for substrate processing using independent ion source and radical sourceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2679US9711316B2Method of cleaning an extraction electrode assembly using pulsed biasingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Jul 18, 2017·4 cites·7 claims
- 2778US10290466B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·1 cites·19 claims
- 2878US8003959B2Ion source cleaning end point detectionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2009·Granted Aug 23, 2011·4 cites·11 claims
- 2977US10410844B2RF clean system for electrostatic elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Sep 10, 2019·2 cites·10 claims
- 3077US8669538B1Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 11, 2014·3 cites·20 claims
- 3176US2024096602A1System And Methods Using An Inline Surface Engineering SourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2023·Application pending·0 cites
- 3274US9034743B2Method for implant productivity enhancementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 19, 2015·3 cites·14 claims
- 3373US11862433B2System and methods using an inline surface engineering sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2021·Granted Jan 2, 2024·0 cites·7 claims
- 3473US8092644B2Method and apparatus for cleaning and surface conditioning objects using plasmaKURUNCZI PETER FRANK·Filed 2006·Granted Jan 10, 2012·8 cites·18 claims
- 3572US8847496B2Inductively coupled plasma flood gun using an immersed low inductance RF coil and multicusp magnetic arrangementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Sep 30, 2014·2 cites·20 claims
- 3672US8003956B2Method and apparatus for controlling beam current uniformity in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Aug 23, 2011·3 cites·18 claims
- 3771US11996266B2Apparatus and techniques for substrate processing using independent ion source and radical sourceAPPLIED MATERIALS INC·Filed 2020·Granted May 28, 2024·0 cites·19 claims
- 3870US12191156B2Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic deposition of thin filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 7, 2025·0 cites·17 claims
- 3970US11495434B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Nov 8, 2022·0 cites·12 claims
- 4069US8659229B2Plasma attenuation for uniformity controlKURUNCZI PETER·Filed 2011·Granted Feb 25, 2014·3 cites·18 claims
- 4169US7476877B2Wafer charge monitoringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Jan 13, 2009·2 cites·20 claims
- 4268US6703771B2Monochromatic vacuum ultraviolet light source for photolithography applications based on a high-pressure microhollow cathode dischargeTRUSTEES STEVENS INST TECH·Filed 2001·Granted Mar 9, 2004·10 cites·2 claims
- 4366US11967489B2Apparatus and techniques for angled etching using multielectrode extraction sourceAPPLIED MATERIALS INC·Filed 2021·Granted Apr 23, 2024·0 cites·10 claims
- 4465US12154753B2Device to control uniformity of extracted ion beamAPPLIED MATERIALS INC·Filed 2021·Granted Nov 26, 2024·0 cites·14 claims
- 4565US11810746B2Variable thickness ion source extraction plateAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·0 cites·28 claims
- 4665US11037758B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Jun 15, 2021·0 cites·16 claims
- 4761US11948781B2Apparatus and system including high angle extraction opticsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·0 cites·20 claims
- 4861US2025095967A1Plasma source with multiple extraction aperturesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4959US11195703B2Apparatus and techniques for angled etching using multielectrode extraction sourceAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·0 cites·6 claims
- 5056US2024339287A1Apparatus, system and techniques for mass analyzed ion beamAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →