Inventor · disambiguated record
Peter Ventzek
Also filed as: VENTZEK PETER · VENTZEK PETER L G · VENTZEK PETER LOWELL GEORGE
65 granted patents·32 pending applications·273 citations·filing 1999–2025
98Inventor score
Top patents by PatentIndex Score
97 records- 0198US10998169B2Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted May 4, 2021·44 cites·20 claims
- 0298US10991554B2Plasma processing system with synchronized signal modulationTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·49 cites·20 claims
- 0397US11094543B1Defect correction on metal resistsTOKYO ELECTRON LTD·Filed 2020·Granted Aug 17, 2021·7 cites·21 claims
- 0496US11342195B1Methods for anisotropic etch of silicon-based materials with selectivity to organic materialsTOKYO ELECTRON LTD·Filed 2021·Granted May 24, 2022·7 cites·20 claims
- 0596US8889534B1Solid state source introduction of dopants and additives for a plasma doping processTOKYO ELECTRON LTD·Filed 2013·Granted Nov 18, 2014·43 cites·20 claims
- 0695US11430643B2Quantification of processing chamber species by electron energy sweepTOKYO ELECTRON LTD·Filed 2020·Granted Aug 30, 2022·7 cites·20 claims
- 0795US11348761B2Impedance matching apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted May 31, 2022·4 cites·6 claims
- 0894US12183583B2Remote source pulsing with advanced pulse controlTOKYO ELECTRON LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 0992US11295937B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2019·Granted Apr 5, 2022·7 cites·20 claims
- 1091US11251021B2Mode-switching plasma systems and methods of operating thereofTOKYO ELECTRON LTD·Filed 2021·Granted Feb 15, 2022·2 cites·20 claims
- 1190US12394600B2Balanced RF resonant antenna systemTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·2 cites·20 claims
- 1290US11056347B2Method for dry etching compound materialsTOKYO ELECTRON LTD·Filed 2020·Granted Jul 6, 2021·2 cites·22 claims
- 1389US11830709B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2021·Granted Nov 28, 2023·1 cites·20 claims
- 1487US12057293B2Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performanceTOKYO ELECTRON LTD·Filed 2021·Granted Aug 6, 2024·1 cites·20 claims
- 1587US8636871B2Plasma processing apparatus, plasma processing method and storage mediumSAWADA IKUO·Filed 2007·Granted Jan 28, 2014·14 cites·18 claims
- 1685US11605536B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2020·Granted Mar 14, 2023·1 cites·20 claims
- 1785US11264212B1Ion angle detectorTOKYO ELECTRON LTD·Filed 2020·Granted Mar 1, 2022·2 cites·20 claims
- 1885US2025364258A1Pulsed capacitively coupled plasma processesTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1982US12387910B2Plasma processing with broadband RF waveformsTOKYO ELECTRON LTD·Filed 2024·Granted Aug 12, 2025·0 cites·22 claims
- 2082US11170981B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·2 cites·20 claims
- 2182US2025391665A1Plasma processing with magnetic ring x pointTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2281US2023399739A1Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2380US2025095983A1Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2479US12176204B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 2579US11557487B2Etching metal during processing of a semiconductor structureTOKYO ELECTRON LTD·Filed 2021·Granted Jan 17, 2023·1 cites·20 claims
- 2678US12400865B2Pulsed capacitively coupled plasma processesTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 2778US11201035B2Radical source with contained plasmaTOKYO ELECTRON LTD·Filed 2018·Granted Dec 14, 2021·2 cites·14 claims
- 2876US12500067B2Apparatus for edge control during plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Dec 16, 2025·0 cites·20 claims
- 2976US11773484B2Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2021·Granted Oct 3, 2023·0 cites·20 claims
- 3076US8409459B2Hollow cathode device and method for using the device to control the uniformity of a plasma processDENPOH KAZUKI·Filed 2008·Granted Apr 2, 2013·6 cites·4 claims
- 3176US2025079178A1Remote source pulsing with advanced pulse controlTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3275US11688586B2Method and apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted Jun 27, 2023·1 cites·22 claims
- 3375US6500315B1Method and apparatus for forming a layer on a substrateMOTOROLA INC·Filed 2000·Granted Dec 31, 2002·15 cites·23 claims
- 3475US2024347319A1Systems for real-time pulse measurement and pulse timing adjustment to control plasma process performanceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3573US12394629B2Plasma processing methods using low frequency bias pulsesTOKYO ELECTRON LTD·Filed 2021·Granted Aug 19, 2025·0 cites·20 claims
- 3673US12020902B2Plasma processing with broadband RF waveformsTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 3772US11393663B2Methods and systems for focus ring thickness determinations and feedback controlTOKYO ELECTRON LTD·Filed 2019·Granted Jul 19, 2022·1 cites·24 claims
- 3872US9252001B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 2, 2016·2 cites·4 claims
- 3971US2025273439A1Method of uniformity controlTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4070US12300468B2Method of uniformity controlTOKYO ELECTRON LTD·Filed 2022·Granted May 13, 2025·0 cites·14 claims
- 4170US11551909B2Ultra-localized and plasma uniformity control in a plasma processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Jan 10, 2023·1 cites·20 claims
- 4269US12451329B2Plasma processing apparatus with tunable electrical characteristicTOKYO ELECTRON LTD·Filed 2021·Granted Oct 21, 2025·0 cites·20 claims
- 4369US12412748B2Plasma processing with magnetic ring X pointTOKYO ELECTRON LTD·Filed 2022·Granted Sep 9, 2025·0 cites·20 claims
- 4469US11545364B2Pulsed capacitively coupled plasma processesTOKYO ELECTRON LTD·Filed 2020·Granted Jan 3, 2023·0 cites·20 claims
- 4568US11158516B2Plasma processing methods using low frequency bias pulsesTOKYO ELECTRON LTD·Filed 2020·Granted Oct 26, 2021·0 cites·20 claims
- 4666US12387919B2ALD process with plasma treatmentTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·14 claims
- 4765US12217935B2Plasma processing methods using multiphase multifrequency bias pulsesTOKYO ELECTRON LTD·Filed 2022·Granted Feb 4, 2025·0 cites·20 claims
- 4864US11605542B2Method for dry etching compound materialsTOKYO ELECTRON LTD·Filed 2021·Granted Mar 14, 2023·0 cites·20 claims
- 4963US9659754B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2013·Granted May 23, 2017·1 cites·11 claims
- 5062US12224160B2Topographic selective depositionTOKYO ELECTRON LTD·Filed 2023·Granted Feb 11, 2025·0 cites·20 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →