Inventor · disambiguated record
Ping-Chung Chung
Also filed as: CHUNG PING-CHUNG
9 granted patents·5 pending applications·132 citations·filing 1998–2020
86Inventor score
Files withUNITED MICROELECTRONICS CORP7CHUNG PING CHUNG2IND TECH RES INST1KAO JIANN-SHIUN1NAT SCIENCE COUNCIL1
Top patents by PatentIndex Score
14 records- 0174US6210754B1Method of adjusting for parallel alignment between a shower head and a heater platform in a chamber used in integrated circuit fabricationUNITED MICROELECTRONICS CORP·Filed 1999·Granted Apr 3, 2001·55 cites·5 claims
- 0262US6217640B1Exhaust gas treatment apparatusUNITED MICROELECTRONICS CORP·Filed 1999·Granted Apr 17, 2001·28 cites·13 claims
- 0360US6303939B1Wafer mapping apparatusUNITED MICROELECTRONICS CORP·Filed 1999·Granted Oct 16, 2001·26 cites·19 claims
- 0454US2021000631A1Vacuum-Molded and Reusable Limb Protecting PadCHUNG PING CHUNG·Filed 2020·Application pending·0 cites
- 0546US2018325715A1Vacuum-molded and reusable limb protecting padCHUNG PING CHUNG·Filed 2016·Application pending·0 cites
- 0643US6011402AElectro-optic apparatus and method for measuring electric-field vectorNAT SCIENCE COUNCIL·Filed 1998·Granted Jan 4, 2000·14 cites·7 claims
- 0739US9149392B2Casting apparatusZHONG BING-TANG·Filed 2013·Granted Oct 6, 2015·0 cites·8 claims
- 0838US2006092416A1In-situ micro-spectro-sensor for detecting gas leakage from vacuum chamber during plasma-based processKAO JIANN-SHIUN·Filed 2005·Application pending·0 cites
- 0936US7572320B2Method and apparatus for removing high concentration ozone from a waste gas steamIND TECH RES INST·Filed 2005·Granted Aug 11, 2009·0 cites·9 claims
- 1034US6569253B2Method of cleaning a chamber of a CVD machine and elements withinUNITED MICROELECTRONICS CORP·Filed 2001·Granted May 27, 2003·0 cites·11 claims
- 1133US6218320B1Method for improving the uniformity of wafer-to-wafer film thicknessUNITED MICROELECTRONICS CORP·Filed 1998·Granted Apr 17, 2001·8 cites·8 claims
- 1233US2002098600A1System and method for status settings of semiconductor equipment with multi chambersUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
- 1332US2002095754A1System and method for status settings of semiconductor equipment with multi chambersUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
- 1424US6315834B1Method for removing extraneous matter by using fluorine-containing solutionUTEK SEMICONDUCTOR CORP·Filed 1999·Granted Nov 13, 2001·1 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →