Inventor · disambiguated record
Piotr Strzyzewski
Also filed as: STRZYZEWSKI PIOTR
4 granted patents·2 pending applications·416 citations·filing 1995–2013
77Inventor score
Top patents by PatentIndex Score
6 records- 0195US6849241B2Device and method for depositing one or more layers on a substrateAIXTRON AG·Filed 2002·Granted Feb 1, 2005·401 cites·20 claims
- 0261US8906456B2Apparatus and method for high-throughput chemical vapor depositionAIXTRON INC·Filed 2013·Granted Dec 9, 2014·0 cites·10 claims
- 0353US6908838B2Method and device for treating semiconductor substratesAIXTRON AG·Filed 2003·Granted Jun 21, 2005·6 cites·14 claims
- 0449US2008096369A1Apparatus and method for high-throughput chemical vapor depositionSTRZYZEWSKI PIOTR·Filed 2005·Application pending·0 cites
- 0537US6089548AProcess and device for converting a liquid stream flow into a gas stream flowFRAUNHOFER GES FORSCHUNG·Filed 1995·Granted Jul 18, 2000·9 cites·3 claims
- 0637US2003056728A1Method and device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrateFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →