Inventor · disambiguated record
Praket P. Jha
Also filed as: JHA PRAKET P · JHA PRAKET PRAKASH
31 granted patents·14 pending applications·48 citations·filing 2014–2024
95Inventor score
Files withAPPLIED MATERIALS INC45
Top patents by PatentIndex Score
45 records- 0196US11170994B1CD dependent gap fill and conformal filmsAPPLIED MATERIALS INC·Filed 2021·Granted Nov 9, 2021·3 cites·20 claims
- 0294US10490436B2Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide filmsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 26, 2019·10 cites·16 claims
- 0391US10276353B2Dual-channel showerhead for formation of film stacksAPPLIED MATERIALS INC·Filed 2016·Granted Apr 30, 2019·4 cites·20 claims
- 0490US11615966B2Flowable film formation and treatmentsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·19 claims
- 0588US10410872B2Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask applicationAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·5 cites·16 claims
- 0686US10246772B2Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devicesAPPLIED MATERIALS INC·Filed 2016·Granted Apr 2, 2019·5 cites·20 claims
- 0786US9390910B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·5 cites·20 claims
- 0882US11699623B2Systems and methods for analyzing defects in CVD filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·1 cites·20 claims
- 0982US10373822B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·2 cites·18 claims
- 1081US11152248B2Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutionsAPPLIED MATERIALS INC·Filed 2020·Granted Oct 19, 2021·1 cites·20 claims
- 1179US9490116B2Gate stack materials for semiconductor applications for lithographic overlay improvementAPPLIED MATERIALS INC·Filed 2015·Granted Nov 8, 2016·3 cites·20 claims
- 1277US10612135B2Method and system for high temperature cleanAPPLIED MATERIALS INC·Filed 2017·Granted Apr 7, 2020·2 cites·20 claims
- 1375US11508611B2Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide filmsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·1 cites·20 claims
- 1474US12300554B2Systems and methods for analyzing defects in CVD filmsAPPLIED MATERIALS INC·Filed 2023·Granted May 13, 2025·0 cites·20 claims
- 1573US10707116B2Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutionsAPPLIED MATERIALS INC·Filed 2018·Granted Jul 7, 2020·1 cites·20 claims
- 1672US11365476B2Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devicesAPPLIED MATERIALS INC·Filed 2019·Granted Jun 21, 2022·1 cites·20 claims
- 1772US2024404823A1Plasma treatment process to densify oxide layersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1871US11804372B2CD dependent gap fill and conformal filmsAPPLIED MATERIALS INC·Filed 2021·Granted Oct 31, 2023·0 cites·11 claims
- 1971US9837265B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·1 cites·7 claims
- 2066US10199388B2VNAND tensile thick TEOS oxideAPPLIED MATERIALS INC·Filed 2016·Granted Feb 5, 2019·1 cites·10 claims
- 2161US12094709B2Plasma treatment process to densify oxide layersAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·0 cites·20 claims
- 2259US2025329530A1Dual plasma treatment processAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2358US11469100B2Methods of post treating dielectric films with microwave radiationAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·0 cites·8 claims
- 2458US10595477B2Oxide with higher utilization and lower costAPPLIED MATERIALS INC·Filed 2018·Granted Mar 24, 2020·0 cites·15 claims
- 2556US2025218763A1Treating silicon nitride based dielectric filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2656US2025364210A1Pecvd trench bottom profile control with pulsed dual rf plasmaAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2755US11967524B23D NAND gate stack reinforcementAPPLIED MATERIALS INC·Filed 2020·Granted Apr 23, 2024·0 cites·19 claims
- 2855US11367614B2Surface roughness for flowable CVD filmAPPLIED MATERIALS INC·Filed 2020·Granted Jun 21, 2022·0 cites·15 claims
- 2955US2025112039A1Seam-free single operation amorphous silicon gap fillAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3054US11170990B2Polysilicon linersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·11 claims
- 3154US2024420950A1Densified seam-free silicon-containing material gap fill processesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3253US12230499B2Methods of post treating silicon nitride based dielectric films with high energy low dose plasmaAPPLIED MATERIALS INC·Filed 2020·Granted Feb 18, 2025·0 cites·19 claims
- 3353US10483282B2VNAND tensile thick TEOS oxideAPPLIED MATERIALS INC·Filed 2019·Granted Nov 19, 2019·0 cites·11 claims
- 3452US2024331975A1Densified seam-free silicon gap fill processesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3552US2024105499A1Molecular layer deposition carbon masks for direct selective deposition of silicon-containing materialsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3649US11107674B2Methods for depositing silicon nitrideAPPLIED MATERIALS INC·Filed 2019·Granted Aug 31, 2021·0 cites·20 claims
- 3749US10593543B2Method of depositing doped amorphous silicon films with enhanced defect control, reduced substrate sensitivity to in-film defects and bubble-free film growthAPPLIED MATERIALS INC·Filed 2018·Granted Mar 17, 2020·0 cites·20 claims
- 3848US11011371B2SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure materialAPPLIED MATERIALS INC·Filed 2017·Granted May 18, 2021·0 cites·19 claims
- 3948US2023360924A1Low temperature carbon gapfillAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4048US2022375747A1Flowable CVD Film Defect ReductionAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4147US11060189B2Method to enable high temperature processing without chamber driftingAPPLIED MATERIALS INC·Filed 2017·Granted Jul 13, 2021·0 cites·20 claims
- 4245US2021175075A1Oxygen radical assisted dielectric film densificationAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4342US2021280451A1Low temperature steam free oxide gapfillAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4438US2019233940A1Treatment methods for silicon nitride thin filmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4534US2017084448A1Low temperature conformal deposition of silicon nitride on high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →