Inventor · disambiguated record
Prashant Raghu
Also filed as: RAGHU PRASHANT
35 granted patents·10 pending applications·109 citations·filing 2005–2024
96Inventor score
Files withMICRON TECHNOLOGY INC28RAGHU PRASHANT4IMONIGIE JEROME A3GREELEY JOSEPH N2GREELEY JOSEPH NEIL2
Top patents by PatentIndex Score
45 records- 0196US9653307B1Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structuresMICRON TECHNOLOGY INC·Filed 2016·Granted May 16, 2017·23 cites·25 claims
- 0290US7659560B2Transistor structuresMICRON TECHNOLOGY INC·Filed 2007·Granted Feb 9, 2010·15 cites·22 claims
- 0389US7902081B2Methods of etching polysilicon and methods of forming pluralities of capacitorsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 8, 2011·15 cites·51 claims
- 0488US7713813B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2005·Granted May 11, 2010·10 cites·20 claims
- 0585US10497558B2Using sacrificial polymer materials in semiconductor processingMICRON TECHNOLOGY INC·Filed 2018·Granted Dec 3, 2019·3 cites·21 claims
- 0684US8962460B2Methods of selectively forming metal-doped chalcogenide materials, methods of selectively doping chalcogenide materials, and methods of forming semiconductor device structures including sameIMONIGIE JEROME A·Filed 2011·Granted Feb 24, 2015·5 cites·27 claims
- 0783US10916418B2Using sacrificial polymer materials in semiconductor processingMICRON TECHNOLOGY INC·Filed 2019·Granted Feb 9, 2021·2 cites·20 claims
- 0882US8283258B2Selective wet etching of hafnium aluminum oxide filmsRAGHU PRASHANT·Filed 2007·Granted Oct 9, 2012·7 cites·22 claims
- 0981US8618000B2Selective wet etching of hafnium aluminum oxide filmsRAGHU PRASHANT·Filed 2012·Granted Dec 31, 2013·4 cites·19 claims
- 1079US9159780B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2015·Granted Oct 13, 2015·2 cites·19 claims
- 1174US8183157B2Method of forming capacitors, and methods of utilizing silicon dioxide-containing masking structuresRANA NARAJI B·Filed 2011·Granted May 22, 2012·4 cites·20 claims
- 1274US7892937B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2008·Granted Feb 22, 2011·3 cites·27 claims
- 1371US11651952B2Using sacrificial polymer materials in semiconductor processingMICRON TECHNOLOGY INC·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 1471US8932933B2Methods of forming hydrophobic surfaces on semiconductor device structures, methods of forming semiconductor device structures, and semiconductor device structuresLABORIANTE IAN C·Filed 2012·Granted Jan 13, 2015·3 cites·27 claims
- 1570US7491650B2Etch compositions and methods of processing a substrateMICRON TECHNOLOGY INC·Filed 2005·Granted Feb 17, 2009·3 cites·17 claims
- 1666US9236427B2Multi-material structures and capacitor-containing semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2014·Granted Jan 12, 2016·3 cites·15 claims
- 1765US8946043B2Methods of forming capacitorsGREELEY JOSEPH NEIL·Filed 2011·Granted Feb 3, 2015·1 cites·13 claims
- 1865US7867845B2Transistor gate forming methods and transistor structuresMICRON TECHNOLOGY INC·Filed 2005·Granted Jan 11, 2011·2 cites·28 claims
- 1963US10479938B2Removing polysiliconMICRON TECHNOLOGY INC·Filed 2018·Granted Nov 19, 2019·0 cites·20 claims
- 2063US8512587B2Highly selective doped oxide etchantRANA NIRAJ·Filed 2007·Granted Aug 20, 2013·1 cites·36 claims
- 2163US7371333B2Methods of etching nickel silicide and cobalt silicide and methods of forming conductive linesMICRON TECHNOLOGY INC·Filed 2005·Granted May 13, 2008·1 cites·62 claims
- 2262US7629266B2Etch compositions and methods of processing a substrateMICRON TECHNOLOGY INC·Filed 2007·Granted Dec 8, 2009·1 cites·15 claims
- 2361US2024224505A1Memory Circuitry And Methods Used In Forming Memory CircuitryMICRON TECHNOLOGY INC·Filed 2023·Application pending·0 cites
- 2460US10113113B2Removing polysiliconMICRON TECHNOLOGY INC·Filed 2017·Granted Oct 30, 2018·0 cites·10 claims
- 2559US8865544B2Methods of forming capacitorsGREELEY JOSEPH NEIL·Filed 2012·Granted Oct 21, 2014·1 cites·11 claims
- 2656US9650570B2Compositions for etching polysiliconMICRON TECHNOLOGY INC·Filed 2015·Granted May 16, 2017·0 cites·19 claims
- 2754US8613864B2Methods of forming semiconductor constructionsRAGHU PRASHANT·Filed 2012·Granted Dec 24, 2013·0 cites·14 claims
- 2854US8252119B2Microelectronic substrate cleaning systems with polyelectrolyte and associated methodsGREELEY JOSEPH N·Filed 2008·Granted Aug 28, 2012·0 cites·18 claims
- 2954US2015084187A1Methods of forming hydrophobic surfaces on semiconductor device structures, methods of forming semiconductor device structures, and semiconductor device structuresMICRON TECHNOLOGY INC·Filed 2014·Application pending·0 cites
- 3054US2014103498A1Selective wet etching of hafnium aluminum oxide filmsMICRON TECHNOLOGY INC·Filed 2013·Application pending·0 cites
- 3154US2024332015A1Methods of forming apparatus comprising crystalline semiconductor materials and metal silicide materials, and related apparatusMICRON TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 3253US9012318B2Etching polysiliconIMONIGIE JEROME A·Filed 2012·Granted Apr 21, 2015·0 cites·24 claims
- 3353US8969217B2Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substratesMICRON TECHNOLOGY INC·Filed 2013·Granted Mar 3, 2015·0 cites·16 claims
- 3453US8492288B2Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substratesFUCSKO JANOS·Filed 2008·Granted Jul 23, 2013·0 cites·25 claims
- 3552US8026148B2Methods of utilizing silicon dioxide-containing masking structuresMICRON TECHNOLOGY INC·Filed 2011·Granted Sep 27, 2011·0 cites·13 claims
- 3651US9614153B2Methods of selectively doping chalcogenide materials and methods of forming semiconductor devicesMICRON TECHNOLOGY INC·Filed 2015·Granted Apr 4, 2017·0 cites·20 claims
- 3750US8349687B2Transistor gate forming methods and transistor structuresMICRON TECHNOLOGY INC·Filed 2010·Granted Jan 8, 2013·0 cites·28 claims
- 3850US8273261B2Methods of forming semiconductor constructionsRAGHU PRASHANT·Filed 2010·Granted Sep 25, 2012·0 cites·12 claims
- 3950US2016013263A1Methods of Forming CapacitorsMICRON TECHNOLOGY INC·Filed 2015·Application pending·0 cites
- 4049US2007207622A1Highly selective doped oxide etchantMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 4148US2012298158A1Microelectronic substrate cleaning systems with polyelectrolyte and associated methodsGREELEY JOSEPH N·Filed 2012·Application pending·0 cites
- 4244US10607851B2Vapor-etch cyclic processMICRON TECHNOLOGY INC·Filed 2017·Granted Mar 31, 2020·0 cites·26 claims
- 4341US2008246124A1Plasma treatment of insulating materialMATHEW JAMES·Filed 2007·Application pending·0 cites
- 4439US2012314171A1Display devices having electrolessly plated conductors and methodsJINDAL ANURAG·Filed 2011·Application pending·0 cites
- 4536US2013334594A1Recessed gate memory apparatuses and methodsIMONIGIE JEROME A·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →