Inventor · disambiguated record
Qiwei Liang
Also filed as: LIANG QIWEI
73 granted patents·31 pending applications·3,114 citations·filing 1999–2024
99Inventor score
Files withAPPLIED MATERIALS INC88MICROMATERIALS LLC7ALTRIA CLIENT SERVICES LLC3YANG JANG-GYOO2ALTRIA CLIENT SERVICES INC1
Top patents by PatentIndex Score
104 records- 0199US9144147B2Semiconductor processing system and methods using capacitively coupled plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Sep 22, 2015·188 cites·11 claims
- 0299US8357435B2Flowable dielectric equipment and processesAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·160 cites·5 claims
- 0398US10354843B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·40 cites·20 claims
- 0498US10269541B2Workpiece processing chamber having a thermal controlled microwave windowAPPLIED MATERIALS INC·Filed 2014·Granted Apr 23, 2019·66 cites·19 claims
- 0598US9978564B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·106 cites·13 claims
- 0698US9132436B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2013·Granted Sep 15, 2015·198 cites·19 claims
- 0797US10748783B2Gas delivery moduleAPPLIED MATERIALS INC·Filed 2019·Granted Aug 18, 2020·17 cites·20 claims
- 0897US10720341B2Gas delivery system for high pressure processing chamberMICROMATERIALS LLC·Filed 2018·Granted Jul 21, 2020·20 cites·9 claims
- 0997US10615007B2Plasma reactor with non-power-absorbing dielectric gas shower plate assemblyAPPLIED MATERIALS INC·Filed 2018·Granted Apr 7, 2020·17 cites·8 claims
- 1097US10529603B2High pressure wafer processing systems and related methodsMICROMATERIALS LLC·Filed 2019·Granted Jan 7, 2020·20 cites·20 claims
- 1197US10224224B2High pressure wafer processing systems and related methodsMICROMATERIALS LLC·Filed 2017·Granted Mar 5, 2019·19 cites·24 claims
- 1297US10203604B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2016·Granted Feb 12, 2019·16 cites·16 claims
- 1397US10179941B1Gas delivery system for high pressure processing chamberMICROMATERIALS LLC·Filed 2017·Granted Jan 15, 2019·29 cites·18 claims
- 1497US7989365B2Remote plasma source seasoningAPPLIED MATERIALS INC·Filed 2009·Granted Aug 2, 2011·621 cites·23 claims
- 1596US10358715B2Integrated cluster tool for selective area depositionAPPLIED MATERIALS INC·Filed 2016·Granted Jul 23, 2019·15 cites·17 claims
- 1696US8894767B2Flow control features of CVD chambersCHUC KIEN N·Filed 2010·Granted Nov 25, 2014·107 cites·16 claims
- 1796US6598559B1Temperature controlled chamberAPPLIED MATERIALS INC·Filed 2000·Granted Jul 29, 2003·573 cites·36 claims
- 1896US6326597B1Temperature control system for process chamberAPPLIED MATERIALS INC·Filed 1999·Granted Dec 4, 2001·659 cites·56 claims
- 1995US10704141B2In-situ CVD and ALD coating of chamber to control metal contaminationAPPLIED MATERIALS INC·Filed 2019·Granted Jul 7, 2020·7 cites·20 claims
- 2095US10675581B2Gas abatement apparatusAPPLIED MATERIALS INC·Filed 2018·Granted Jun 9, 2020·19 cites·14 claims
- 2195US10240232B2Gas control in process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 26, 2019·5 cites·17 claims
- 2294US10283321B2Semiconductor processing system and methods using capacitively coupled plasmaYANG JANG GYOO·Filed 2011·Granted May 7, 2019·39 cites·15 claims
- 2394US9733579B2Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layerAPPLIED MATERIALS INC·Filed 2014·Granted Aug 15, 2017·10 cites·15 claims
- 2492US9905400B2Plasma reactor with non-power-absorbing dielectric gas shower plate assemblyAPPLIED MATERIALS INC·Filed 2014·Granted Feb 27, 2018·10 cites·17 claims
- 2591US11527421B2Gas delivery system for high pressure processing chamberMICROMATERIALS LLC·Filed 2020·Granted Dec 13, 2022·2 cites·17 claims
- 2691US10474033B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2017·Granted Nov 12, 2019·4 cites·18 claims
- 2790US11094573B2Method and apparatus for thin wafer carrierAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·3 cites·18 claims
- 2889US11112697B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·3 cites·10 claims
- 2989US10947621B2Low vapor pressure chemical deliveryAPPLIED MATERIALS INC·Filed 2018·Granted Mar 16, 2021·2 cites·20 claims
- 3086US10590530B2Gas control in process chamberAPPLIED MATERIALS INC·Filed 2019·Granted Mar 17, 2020·1 cites·20 claims
- 3186US10550472B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2014·Granted Feb 4, 2020·2 cites·4 claims
- 3285US10096466B2Pulsed plasma for film depositionAPPLIED MATERIALS INC·Filed 2016·Granted Oct 9, 2018·4 cites·24 claims
- 3384US10431427B2Monopole antenna array source with phase shifted zones for semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·2 cites·25 claims
- 3484US7789993B2Internal balanced coil for inductively coupled high density plasma processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Sep 7, 2010·8 cites·6 claims
- 3584US7572647B2Internal balanced coil for inductively coupled high density plasma processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 11, 2009·10 cites·7 claims
- 3683US12112972B2Rotating biasable pedestal and electrostatic chuck in semiconductor process chamberAPPLIED MATERIALS INC·Filed 2021·Granted Oct 8, 2024·1 cites·18 claims
- 3783US6508198B1Automatic tuning in a tapped RF transformer inductive source of a plasma reactor for processing a semiconductor waferAPPLIED MATERIALS INC·Filed 2000·Granted Jan 21, 2003·23 cites·27 claims
- 3882US7651587B2Two-piece dome with separate RF coils for inductively coupled plasma reactorsAPPLIED MATERIALS INC·Filed 2005·Granted Jan 26, 2010·8 cites·15 claims
- 3981US11976973B2Blending of agricultural products via hyperspectral imaging and analysisALTRIA CLIENT SERVICES LLC·Filed 2022·Granted May 7, 2024·0 cites·15 claims
- 4081US11066747B2Chemical delivery chamber for self-assembled monolayer processesAPPLIED MATERIALS INC·Filed 2017·Granted Jul 20, 2021·3 cites·14 claims
- 4181US9996745B2Blending of agricultural products via hyperspectral imaging and analysisALTRIA CLIENT SERVICES INC·Filed 2013·Granted Jun 12, 2018·5 cites·14 claims
- 4281US7510624B2Self-cooling gas delivery apparatus under high vacuum for high density plasma applicationsAPPLIED MATERIALS INC·Filed 2004·Granted Mar 31, 2009·21 cites·17 claims
- 4380US6894474B2Non-intrusive plasma probeAPPLIED MATERIALS INC·Filed 2002·Granted May 17, 2005·38 cites·42 claims
- 4479US11756803B2Gas delivery system for high pressure processing chamberMICROMATERIALS LLC·Filed 2022·Granted Sep 12, 2023·0 cites·20 claims
- 4577US12203171B2Batch curing chamber with gas distribution and individual pumpingAPPLIED MATERIALS INC·Filed 2022·Granted Jan 21, 2025·0 cites·9 claims
- 4677US11899366B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·0 cites·10 claims
- 4777US11244808B2Monopole antenna array source for semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Feb 8, 2022·1 cites·17 claims
- 4877US10113236B2Batch curing chamber with gas distribution and individual pumpingAPPLIED MATERIALS INC·Filed 2014·Granted Oct 30, 2018·2 cites·20 claims
- 4977US10039157B2Workpiece processing chamber having a rotary microwave plasma sourceAPPLIED MATERIALS INC·Filed 2014·Granted Jul 31, 2018·4 cites·15 claims
- 5074US12198951B2High pressure wafer processing systems and related methodsAPPLIED MATERIALS INC·Filed 2018·Granted Jan 14, 2025·1 cites·17 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →