Inventor · disambiguated record
Qiliang Yan
Also filed as: YAN QILIANG
20 granted patents·130 citations·filing 2005–2020
94Inventor score
Top patents by PatentIndex Score
20 records- 0195US10635776B1Producing mask layouts with rounded cornersSYNOPSYS INC·Filed 2018·Granted Apr 28, 2020·8 cites·19 claims
- 0292US8918743B1Edge-based full chip mask topography modelingSYNOPSYS INC·Filed 2013·Granted Dec 23, 2014·38 cites·25 claims
- 0389US9348964B2MASK3D model accuracy enhancement for small feature coupling effectSYNOPSYS INC·Filed 2014·Granted May 24, 2016·9 cites·20 claims
- 0489US7954071B2Assist feature placement based on a focus-sensitive cost-covariance fieldSYNOPSYS INC·Filed 2008·Granted May 31, 2011·12 cites·23 claims
- 0587US7496880B2Method and apparatus for assessing the quality of a process modelSYNOPSYS INC·Filed 2005·Granted Feb 24, 2009·10 cites·9 claims
- 0685US7721246B2Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layoutSYNOPSYS INC·Filed 2006·Granted May 18, 2010·11 cites·18 claims
- 0783US8719736B1Compact and accurate wafer topography proximity effect modeling for full chip simulationSYNOPSYS INC·Filed 2013·Granted May 6, 2014·5 cites·22 claims
- 0883US7243332B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jul 10, 2007·10 cites·12 claims
- 0982US8972229B2Fast 3D mask model based on implicit countorsSYNOPSYS INC·Filed 2013·Granted Mar 3, 2015·9 cites·19 claims
- 1081US7784018B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2007·Granted Aug 24, 2010·4 cites·4 claims
- 1177US7320119B2Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jan 15, 2008·3 cites·14 claims
- 1272US7681172B2Method and apparatus for modeling an apodization effect in an optical lithography systemSYNOPSYS INC·Filed 2007·Granted Mar 16, 2010·5 cites·23 claims
- 1369US8296688B2Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance fieldBARNES LEVI D·Filed 2011·Granted Oct 23, 2012·2 cites·19 claims
- 1463US7933471B2Method and system for correlating physical model representation to pattern layoutSYNOPSYS INC·Filed 2007·Granted Apr 26, 2011·3 cites·21 claims
- 1562US7308673B2Method and apparatus for correcting 3D mask effectsSYNOPSYS INC·Filed 2005·Granted Dec 11, 2007·1 cites·21 claims
- 1660US11314171B2Lithography improvement based on defect probability distributions and critical dimension variationsSYNOPSYS INC·Filed 2020·Granted Apr 26, 2022·0 cites·20 claims
- 1759US9354511B2Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masksSYNOPSYS INC·Filed 2013·Granted May 31, 2016·0 cites·21 claims
- 1856US10691015B2Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masksSYNOPSYS INC·Filed 2016·Granted Jun 23, 2020·0 cites·14 claims
- 1948US7739645B2Method and apparatus for determining a process model using a 2-D-pattern detecting kernelSYNOPSYS INC·Filed 2007·Granted Jun 15, 2010·0 cites·20 claims
- 2041US8184897B2Method and apparatus for determining an optical threshold and a resist biasLI JIANLIANG·Filed 2008·Granted May 22, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →