Inventor · disambiguated record
Qunhua Wang
Also filed as: WANG QUNHUA
21 granted patents·12 pending applications·1,642 citations·filing 2002–2023
95Inventor score
Top patents by PatentIndex Score
33 records- 0198US8721791B2Showerhead support structure for improved gas flowTINER ROBIN L·Filed 2011·Granted May 13, 2014·516 cites·15 claims
- 0298US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 0398US7785672B2Method of controlling the film properties of PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2004·Granted Aug 31, 2010·247 cites·20 claims
- 0491US10262837B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2015·Granted Apr 16, 2019·5 cites·14 claims
- 0590US7125758B2Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Oct 24, 2006·47 cites·23 claims
- 0688US9200368B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2011·Granted Dec 1, 2015·6 cites·95 claims
- 0785US10087524B2Showerhead support structure for improved gas flowAPPLIED MATERIALS INC·Filed 2014·Granted Oct 2, 2018·5 cites·20 claims
- 0884US10312058B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·20 claims
- 0980USD1064407SHair removal deviceWANG QUNHUA·Filed 2023·Granted Feb 25, 2025·6 cites·1 claims
- 1080US9818606B2Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixtureAPPLIED MATERIALS INC·Filed 2014·Granted Nov 14, 2017·4 cites·18 claims
- 1177US9299558B2Run-to-run stability of film depositionAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·3 cites·17 claims
- 1275USD664249SFlow blocker plateWANG QUNHUA·Filed 2011·Granted Jul 24, 2012·21 cites·1 claims
- 1373US8002896B2Shadow frame with cross beam for semiconductor equipmentAPPLIED MATERIALS INC·Filed 2005·Granted Aug 23, 2011·1 cites·12 claims
- 1473US6960263B2Shadow frame with cross beam for semiconductor equipmentAPPLIED MATERIALS INC·Filed 2002·Granted Nov 1, 2005·10 cites·14 claims
- 1569US9287137B2Methods for depositing a silicon containing layer with argon gas dilutionWANG QUNHUA·Filed 2012·Granted Mar 15, 2016·2 cites·16 claims
- 1666US7501161B2Methods and apparatus for reducing arcing during plasma processingAPPLIED MATERIALS INC·Filed 2004·Granted Mar 10, 2009·13 cites·7 claims
- 1762US2008118663A1Contamination reducing liner for inductively coupled chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1861US2012009356A1Contamination reducing liner for inductively coupled chamberCHOI SOO YOUNG·Filed 2011·Application pending·0 cites
- 1957US2006236934A1Plasma uniformity control by gas diffuser hole designCHOI SOO Y·Filed 2006·Application pending·0 cites
- 2057US2008178807A1Gas distribution uniformity improvement by baffle plate with multi-size holes for large size pecvd systemsWANG QUNHUA·Filed 2008·Application pending·0 cites
- 2156US2008282982A1Apparatus and method for deposition over large area substratesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2254US2008292811A1Chamber idle process for improved repeatability of filmsCHOI YOUNG-JIN·Filed 2007·Application pending·0 cites
- 2353US10676817B2Flip edge shadow frameWANG QUNHUA·Filed 2012·Granted Jun 9, 2020·0 cites·15 claims
- 2453US2014251216A1Flip edge shadow frameWANG QUNHUA·Filed 2013·Application pending·0 cites
- 2551US2006228490A1Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systemsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2650US10697063B2Corner spoiler for improving profile uniformityAPPLIED MATERIALS INC·Filed 2015·Granted Jun 30, 2020·0 cites·10 claims
- 2749US2013004681A1Mini blocker plate with standoff spacersAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 2847US9048099B2Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser annealAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·0 cites·20 claims
- 2944US11773489B2Gas confiner assembly for eliminating shadow frameAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2023·0 cites·19 claims
- 3044US2006090773A1Sulfur hexafluoride remote plasma source cleanAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 3141US2012009347A1Precise temperature control for teos application by heat transfer fluidLEE DONGSUH·Filed 2010·Application pending·0 cites
- 3236US2003203123A1System and method for metal induced crystallization of polycrystalline thin film transistorsAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 3333US12345991B2Electrochromic glass and method for manufacturing sameNANTONG FANHUA NEW MATERIALS TECH CO LTD·Filed 2020·Granted Jul 1, 2025·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →