Inventor · disambiguated record
Ranadeep Bhowmick
Also filed as: BHOWMICK RANADEEP
17 granted patents·11 pending applications·63 citations·filing 2013–2025
91Inventor score
Top patents by PatentIndex Score
28 records- 0197US11935726B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2021·Granted Mar 19, 2024·6 cites·31 claims
- 0297US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 0396US12387909B2Low frequency RF generator and associated electrostatic chuckLAM RES CORP·Filed 2021·Granted Aug 12, 2025·3 cites·20 claims
- 0496US11908660B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2022·Granted Feb 20, 2024·2 cites·20 claims
- 0594US11158488B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2019·Granted Oct 26, 2021·13 cites·36 claims
- 0692US11335539B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2018·Granted May 17, 2022·6 cites·29 claims
- 0789US10861708B2Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2019·Granted Dec 8, 2020·4 cites·20 claims
- 0887US12308211B2Systems and methods for use of low frequency harmonics in bias radiofrequency supply to control uniformity of plasma process results across substrateLAM RES CORP·Filed 2021·Granted May 20, 2025·1 cites·28 claims
- 0987US12131886B2Systems and methods for extracting process control information from radiofrequency supply system of plasma processing systemLAM RES CORP·Filed 2021·Granted Oct 29, 2024·1 cites·17 claims
- 1086US12354840B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2024·Granted Jul 8, 2025·0 cites·20 claims
- 1181US12080518B2Impedance match with an elongated RF strapLAM RES CORP·Filed 2021·Granted Sep 3, 2024·1 cites·22 claims
- 1281US2025054730A1Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing SystemLAM RES CORP·Filed 2024·Application pending·0 cites
- 1379US2025253135A1Systems and Methods for Use of Low Frequency Harmonics in Bias Radiofrequency Supply to Control Uniformity of Plasma Process Results Across SubstrateLAM RES CORP·Filed 2025·Application pending·0 cites
- 1477US2024395504A1Impedance match with an elongated rf strapLAM RES CORP·Filed 2024·Application pending·0 cites
- 1576US2025273433A1Systems and methods for using binning to increase power during a low frequency cycleLAM RES CORP·Filed 2025·Application pending·0 cites
- 1669US12476082B2Radiofrequency signal filter arrangement for plasma processing systemLAM RES CORP·Filed 2021·Granted Nov 18, 2025·0 cites·20 claims
- 1769US12266505B2Systems and methods for using binning to increase power during a low frequency cycleLAM RES CORP·Filed 2021·Granted Apr 1, 2025·0 cites·22 claims
- 1869US12255052B2Process control for ion energy delivery using multiple generators and phase controlLAM RES CORP·Filed 2021·Granted Mar 18, 2025·0 cites·19 claims
- 1969US2025191882A1Process Control for Ion Energy Delivery Using Multiple Generators and Phase ControlLAM RES CORP·Filed 2025·Application pending·0 cites
- 2064US9257300B2Fluorocarbon based aspect-ratio independent etchingLAM RES CORP·Filed 2013·Granted Feb 9, 2016·1 cites·26 claims
- 2162US12362159B2Systems and methods for controlling a plasma sheath characteristicLAM RES CORP·Filed 2022·Granted Jul 15, 2025·0 cites·19 claims
- 2258US2025166969A1Systems and methods for reducing reflected power after a state transitionLAM RES CORP·Filed 2023·Application pending·0 cites
- 2358US2025210309A1Systems and methods for controlling a power limiterLAM RES CORP·Filed 2023·Application pending·0 cites
- 2457US2025118534A1Systems and methods for central frequency tuningLAM RES CORP·Filed 2022·Application pending·0 cites
- 2557US2025140526A1Systems and methods for reducing reflected power associated with an hf rf generator efficientlyLAM RES CORP·Filed 2022·Application pending·0 cites
- 2653US2023215694A1Duty cycle control to achieve uniformityLAM RES CORP·Filed 2021·Application pending·0 cites
- 2748US2023059495A1Optimization of Radiofrequency Signal Ground Return in Plasma Processing SystemLAM RES CORP·Filed 2021·Application pending·0 cites
- 2844US10366869B2Active feedback control of subsystems of a process moduleLAM RES CORP·Filed 2017·Granted Jul 30, 2019·0 cites·30 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →