Inventor · disambiguated record
Rafael C. Howell
Also filed as: HOWELL RAFAEL C
22 granted patents·7 pending applications·106 citations·filing 2011–2025
93Inventor score
Top patents by PatentIndex Score
29 records- 0196US8898599B2Gradient-based pattern and evaluation point selectionLIU XIAOFENG·Filed 2013·Granted Nov 25, 2014·17 cites·20 claims
- 0295US10025201B2Flows of optimization for lithographic processesASML NETHERLANDS BV·Filed 2015·Granted Jul 17, 2018·6 cites·20 claims
- 0395US9588438B2Optimization flows of source, mask and projection opticsHSU DUAN-FU·Filed 2011·Granted Mar 7, 2017·60 cites·22 claims
- 0494US11972194B2Method for determining patterning device pattern based on manufacturabilityASML NETHERLANDS BV·Filed 2022·Granted Apr 30, 2024·2 cites·20 claims
- 0594US10990003B2Binarization method and freeform mask optimization flowASML NETHERLANDS BV·Filed 2019·Granted Apr 27, 2021·6 cites·20 claims
- 0688US11232249B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Jan 25, 2022·5 cites·20 claims
- 0787US11586114B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2019·Granted Feb 21, 2023·2 cites·20 claims
- 0884US10191384B2Discrete source mask optimizationASML NETHERLANDS BV·Filed 2014·Granted Jan 29, 2019·3 cites·21 claims
- 0981US2024419086A1Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1080US11789371B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2022·Granted Oct 17, 2023·0 cites·20 claims
- 1179US10558124B2Discrete source mask optimizationASML NETHERLANDS BV·Filed 2019·Granted Feb 11, 2020·1 cites·20 claims
- 1278US11580289B2Method for determining patterning device pattern based on manufacturabilityASML NETHERLANDS BV·Filed 2019·Granted Feb 14, 2023·1 cites·22 claims
- 1376US11977334B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2022·Granted May 7, 2024·0 cites·20 claims
- 1476US10401732B2Optimization flows of source, mask and projection opticsASML NETHERLANDS BV·Filed 2017·Granted Sep 3, 2019·1 cites·20 claims
- 1574US11409203B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2021·Granted Aug 9, 2022·0 cites·21 claims
- 1671US11734490B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2021·Granted Aug 22, 2023·0 cites·22 claims
- 1770US2025138433A1Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1868US11614690B2Methods of tuning process modelsASML NETHERLANDS BV·Filed 2018·Granted Mar 28, 2023·1 cites·20 claims
- 1967US12210291B2Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 2066US12092963B2Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2020·Granted Sep 17, 2024·0 cites·20 claims
- 2165US11506984B2Simulation of lithography using multiple-sampling of angular distribution of source radiationASML NETHERLANDS BV·Filed 2016·Granted Nov 22, 2022·1 cites·24 claims
- 2263US10459346B2Flows of optimization for lithographic processesASML NETHERLANDS BV·Filed 2018·Granted Oct 29, 2019·0 cites·20 claims
- 2361US11016395B2Methods of determining scattering of radiation by structures of finite thicknesses on a patterning deviceASML NETHERLANDS BV·Filed 2017·Granted May 25, 2021·0 cites·22 claims
- 2459US2025189881A1Lithographic pattern representation with curvilinear elementsASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2559US2024353749A1Methods, software, and systems for determination of constant-width sub-resolution assist featuresASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2656US2024241436A1Determining mask rule check violations and mask designASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2746US2022276564A1Method and apparatus for photolithographic imagingASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2843US11054750B2Profile aware source-mask optimizationASML NETHERLANDS BV·Filed 2014·Granted Jul 6, 2021·0 cites·20 claims
- 2941US2020380362A1Methods for training machine learning model for computation lithographyASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →