Inventor · disambiguated record
Ranee W. Kwong
Also filed as: KWONG RANEE · KWONG RANEE W · KWONG RANEE W-L · KWONG RANEE WAI-LING
45 granted patents·5 pending applications·1,149 citations·filing 1985–2014
98Inventor score
Top patents by PatentIndex Score
50 records- 0199US6420088B1Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2000·Granted Jul 16, 2002·214 cites·8 claims
- 0298US6503692B2Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2002·Granted Jan 7, 2003·85 cites·9 claims
- 0395US6420084B1Mask-making using resist having SIO bond-containing polymerIBM·Filed 2000·Granted Jul 16, 2002·83 cites·28 claims
- 0492US5114826APhotosensitive polyimide compositionsIBM·Filed 1989·Granted May 19, 1992·98 cites·23 claims
- 0592US4692205ASilicon-containing polyimides as oxygen etch stop and dual dielectric coatingsIBM·Filed 1986·Granted Sep 8, 1987·149 cites·14 claims
- 0689US8236476B2Multiple exposure photolithography methods and photoresist compositionsCHEN KUANG-JUNG·Filed 2008·Granted Aug 7, 2012·7 cites·4 claims
- 0788US6939664B2Low-activation energy silicon-containing resist systemIBM·Filed 2003·Granted Sep 6, 2005·30 cites·20 claims
- 0888US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 0987US7563563B2Wet developable bottom antireflective coating composition and method for use thereofIBM·Filed 2006·Granted Jul 21, 2009·8 cites·1 claims
- 1085US8999624B2Developable bottom antireflective coating composition and pattern forming method using thereofCHEN KUANG-JUNG·Filed 2012·Granted Apr 7, 2015·5 cites·13 claims
- 1184US5322765ADry developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Jun 21, 1994·47 cites·23 claims
- 1283US5296332ACrosslinkable aqueous developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Mar 22, 1994·49 cites·24 claims
- 1383US4978594AFluorine-containing base layer for multi-layer resist processesIBM·Filed 1988·Granted Dec 18, 1990·39 cites·13 claims
- 1481US8568960B2Multiple exposure photolithography methodsCHEN KUANG-JUNG·Filed 2012·Granted Oct 29, 2013·2 cites·20 claims
- 1580US6653045B2Radiation sensitive silicon-containing negative resists and use thereofIBM·Filed 2001·Granted Nov 25, 2003·15 cites·16 claims
- 1679US8835307B2Method and structure for reworking antireflective coating over semiconductor substrateAKINMADE-YUSUFF HAKEEM·Filed 2012·Granted Sep 16, 2014·4 cites·11 claims
- 1779US8373271B2Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabricationIBM·Filed 2010·Granted Feb 12, 2013·4 cites·28 claims
- 1878US5240812ATop coat for acid catalyzed resistsIBM·Filed 1991·Granted Aug 31, 1993·35 cites·8 claims
- 1977US8288271B2Method for reworking antireflective coating over semiconductor substrateAKINMADE YUSUFF HAKEEM·Filed 2009·Granted Oct 16, 2012·5 cites·13 claims
- 2077US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 2176US6543617B2Packaged radiation sensitive coated workpiece process for making and method of storing sameIBM·Filed 2001·Granted Apr 8, 2003·16 cites·49 claims
- 2274US9040225B2Developable bottom antireflective coating composition and pattern forming method using thereofIBM·Filed 2014·Granted May 26, 2015·2 cites·12 claims
- 2374US8846296B2Photoresist compositionsCHEN KUANG-JUNG·Filed 2012·Granted Sep 30, 2014·1 cites·15 claims
- 2473US6821718B2Radiation sensitive silicon-containing negative resists and use thereofIBM·Filed 2003·Granted Nov 23, 2004·10 cites·18 claims
- 2573US6458907B1Organometallic polymers and use thereofIBM·Filed 2000·Granted Oct 1, 2002·10 cites·32 claims
- 2673US6436605B1Plasma resistant composition and use thereofIBM·Filed 1999·Granted Aug 20, 2002·31 cites·25 claims
- 2772US6245492B1Photoresist system and process for aerial image enhancementIBM·Filed 1998·Granted Jun 12, 2001·32 cites·20 claims
- 2872US6171757B1Organometallic polymers and use thereofIBM·Filed 1999·Granted Jan 9, 2001·26 cites·28 claims
- 2972US4665006APositive resist system having high resistance to oxygen reactive ion etchingIBM·Filed 1985·Granted May 12, 1987·21 cites·13 claims
- 3067US6689540B2Polymers and use thereofIBM·Filed 2002·Granted Feb 10, 2004·7 cites·18 claims
- 3165US5115090AViscosity stable, essentially gel-free polyamic acid compositionsSACHDEV KRISHNA G·Filed 1990·Granted May 19, 1992·39 cites·13 claims
- 3263US9235119B2Exposure photolithography methodsGLOBALFOUNDRIES INC·Filed 2014·Granted Jan 12, 2016·0 cites·19 claims
- 3363US8021828B2Photoresist compositions and methods related to near field masksIBM·Filed 2008·Granted Sep 20, 2011·1 cites·12 claims
- 3460US6770419B2Low silicon-outgassing resist for bilayer lithographyIBM·Filed 2002·Granted Aug 3, 2004·14 cites·7 claims
- 3560US6586156B2Etch improved resist systems containing acrylate (or methacrylate) silane monomersIBM·Filed 2001·Granted Jul 1, 2003·6 cites·23 claims
- 3657US7168224B2Method of making a packaged radiation sensitive resist film-coated workpieceIBM·Filed 2002·Granted Jan 30, 2007·4 cites·91 claims
- 3755US8202678B2Wet developable bottom antireflective coating composition and method for use thereofCHEN KUANG-JUNG J·Filed 2009·Granted Jun 19, 2012·0 cites·21 claims
- 3848US6140015APhotoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branchingIBM·Filed 1998·Granted Oct 31, 2000·9 cites·17 claims
- 3947US8053172B2Photoresists and methods for optical proximity correctionIBM·Filed 2008·Granted Nov 8, 2011·2 cites·23 claims
- 4047US6265134B1Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branchingIBM·Filed 2000·Granted Jul 24, 2001·1 cites·13 claims
- 4147US2012205786A1Method and structure for reworking antireflective coating over semiconductor substrateAKINMADE-YUSUFF HAKEEM·Filed 2012·Application pending·0 cites
- 4246US6346362B1Polymers and use thereofIBM·Filed 2000·Granted Feb 12, 2002·0 cites·14 claims
- 4339US2008248208A1Apparatus and method for measuring the quantity of condensable materials which outgas during cure of organic thin filmsCHACE MARK STEPHEN·Filed 2007·Application pending·0 cites
- 4439US2006089000A1Material and process for etched structure filling and planarizingIBM·Filed 2004·Application pending·0 cites
- 4539US2005106494A1Silicon-containing resist systems with cyclic ketal protecting groupsIBM·Filed 2003·Application pending·0 cites
- 4637US5307357AProtection means for ridge waveguide laser structures using thick organic filmsIBM·Filed 1992·Granted Apr 26, 1994·6 cites·5 claims
- 4736US6770418B2Positive resist compositions containing non-polymeric siliconIBM·Filed 2001·Granted Aug 3, 2004·1 cites·17 claims
- 4835US2007231736A1Bottom antireflective coating composition and method for use thereofCHEN KUANG-JUNG J·Filed 2006·Application pending·0 cites
- 4932US9012133B2Removal of alkaline crystal defects in lithographic patterningPEREZ JAVIER J·Filed 2011·Granted Apr 21, 2015·0 cites·21 claims
- 5028US6153696AProcess for forming carbonates of hydroxyaromatic compoundsIBM·Filed 1993·Granted Nov 28, 2000·0 cites·17 claims
Join the waitlist — get patent alerts
Get an alert when Ranee W. Kwong files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →