Inventor · disambiguated record
Ratnam Sooriyakumaran
Also filed as: SOORIYAKUMARAN RATNAM
119 granted patents·7 pending applications·2,396 citations·filing 1992–2018
99Inventor score
Top patents by PatentIndex Score
126 records- 0199US7521090B1Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Apr 21, 2009·158 cites·25 claims
- 0299US7306853B2Patternable low dielectric constant materials and their use in ULSI interconnectionIBM·Filed 2005·Granted Dec 11, 2007·64 cites·10 claims
- 0399US7041748B2Patternable low dielectric constant materials and their use in ULSI interconnectionIBM·Filed 2003·Granted May 9, 2006·98 cites·13 claims
- 0498US7393624B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 1, 2008·57 cites·20 claims
- 0598US6087064ASilsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic methodIBM·Filed 1998·Granted Jul 11, 2000·234 cites·34 claims
- 0697US7563558B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 21, 2009·34 cites·16 claims
- 0796US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0896US6730454B2Antireflective SiO-containing compositions for hardmask layerIBM·Filed 2002·Granted May 4, 2004·112 cites·11 claims
- 0996US5492793APhotoresist compositionIBM·Filed 1994·Granted Feb 20, 1996·157 cites·9 claims
- 1095US9671694B1Wet strippable gap fill materialsIBM·Filed 2016·Granted Jun 6, 2017·12 cites·17 claims
- 1195US9244345B1Non-ionic photo-acid generating polymers for resist applicationsIBM·Filed 2014·Granted Jan 26, 2016·13 cites·37 claims
- 1295US6420503B1Norbornene sulfonamide polymersSUMITOMO BAKELITE CO·Filed 2000·Granted Jul 16, 2002·74 cites·20 claims
- 1394US9337033B1Dielectric tone inversion materialsIBM·Filed 2015·Granted May 10, 2016·9 cites·15 claims
- 1494US9022227B2Composite membranes and methods of preparation thereofNA YOUNG-HYE·Filed 2011·Granted May 5, 2015·19 cites·6 claims
- 1594US7468330B2Imprint process using polyhedral oligomeric silsesquioxane based imprint materialsIBM·Filed 2006·Granted Dec 23, 2008·23 cites·1 claims
- 1693US7399581B2Photoresist topcoat for a photolithographic processIBM·Filed 2005·Granted Jul 15, 2008·14 cites·14 claims
- 1792US9244348B2Chemically amplified negative resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Jan 26, 2016·8 cites·5 claims
- 1892US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 1992US7709370B2Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structuresIBM·Filed 2007·Granted May 4, 2010·22 cites·13 claims
- 2092US7300739B2Negative resists based on a acid-catalyzed elimination of polar moleculesIBM·Filed 2003·Granted Nov 27, 2007·33 cites·27 claims
- 2192US6653048B2High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2002·Granted Nov 25, 2003·30 cites·25 claims
- 2292US6444408B1High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2000·Granted Sep 3, 2002·35 cites·26 claims
- 2391US8895104B2Thin film composite membranes embedded with molecular cage compoundsNA YOUNG-HYE·Filed 2011·Granted Nov 25, 2014·8 cites·15 claims
- 2491US7883828B2Functionalized carbosilane polymers and photoresist compositions containing the sameIBM·Filed 2008·Granted Feb 8, 2011·7 cites·9 claims
- 2591US5985524AProcess for using bilayer photoresistIBM·Filed 1997·Granted Nov 16, 1999·77 cites·37 claims
- 2690US8029971B2Photopatternable dielectric materials for BEOL applications and methods for useIBM·Filed 2008·Granted Oct 4, 2011·11 cites·24 claims
- 2790US5401614AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Mar 28, 1995·68 cites·5 claims
- 2889US8727135B2Composite filtration membranes and methods of preparation thereofCHENG JOY·Filed 2010·Granted May 20, 2014·9 cites·34 claims
- 2989US8011517B2Composite membranes with performance enhancing layersIBM·Filed 2009·Granted Sep 6, 2011·18 cites·11 claims
- 3089US7358029B2Low activation energy dissolution modification agents for photoresist applicationsIBM·Filed 2005·Granted Apr 15, 2008·9 cites·31 claims
- 3188US8734904B2Methods of forming topographical features using segregating polymer mixturesCHENG JOY·Filed 2010·Granted May 27, 2014·9 cites·36 claims
- 3288US7141692B2Molecular photoresists containing nonpolymeric silsesquioxanesIBM·Filed 2003·Granted Nov 28, 2006·19 cites·69 claims
- 3388US6939664B2Low-activation energy silicon-containing resist systemIBM·Filed 2003·Granted Sep 6, 2005·30 cites·20 claims
- 3488US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 3588US5554485AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Sep 10, 1996·56 cites·20 claims
- 3688US5385804ASilicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymerIBM·Filed 1992·Granted Jan 31, 1995·44 cites·3 claims
- 3787US9281212B1Dielectric tone inversion materialsIBM·Filed 2014·Granted Mar 8, 2016·6 cites·15 claims
- 3886US6340734B1Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic methodIBM·Filed 1999·Granted Jan 22, 2002·73 cites·7 claims
- 3986US6165678ALithographic photoresist composition and process for its use in the manufacture of integrated circuitsIBM·Filed 1998·Granted Dec 26, 2000·59 cites·18 claims
- 4085US5625020APhotoresist compositionIBM·Filed 1995·Granted Apr 29, 1997·46 cites·2 claims
- 4185US5609989AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1995·Granted Mar 11, 1997·47 cites·11 claims
- 4284US8026293B2Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materialsIBM·Filed 2008·Granted Sep 27, 2011·4 cites·18 claims
- 4383US9333465B2Thin film composite membranes embedded with molecular cage compoundsGLOBALFOUNDRIES INC·Filed 2014·Granted May 10, 2016·4 cites·8 claims
- 4483US7989026B2Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Aug 2, 2011·4 cites·1 claims
- 4583US5962184APhotoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituentIBM·Filed 1996·Granted Oct 5, 1999·48 cites·12 claims
- 4683US5338818ASilicon containing positive resist for DUV lithographyIBM·Filed 1992·Granted Aug 16, 1994·44 cites·4 claims
- 4782US10174229B2Adhesive resins for wafer bondingIBM·Filed 2017·Granted Jan 8, 2019·2 cites·16 claims
- 4882US8802351B2Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithographyBOZANO LUISA DOMINICA·Filed 2012·Granted Aug 12, 2014·4 cites·21 claims
- 4982US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 5081US8857629B2Composite membrane with multi-layered active layerALLEN ROBERT DAVID·Filed 2010·Granted Oct 14, 2014·4 cites·8 claims
Showing the top 50 of 126 patent records by PatentIndex Score.
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