Inventor · disambiguated record
Reza Bayati
Also filed as: BAYATI REZA
1 granted patent·12 pending applications·1 citations·filing 2020–2024
16Inventor score
Top patents by PatentIndex Score
13 records- 0175US12341002B2Low stress films for advanced semiconductor applicationsLAM RES CORP·Filed 2020·Granted Jun 24, 2025·1 cites·17 claims
- 0254US2025294792A1Integrated circuit structures having cut metal gates with dielectric plugsINTEL CORP·Filed 2024·Application pending·0 cites
- 0354US2025204042A1Backside self-aligned backbone for forksheet transistorsINTEL CORP·Filed 2023·Application pending·0 cites
- 0450US2025159932A1Integrated circuit structures having metal gate cut plug structuresINTEL CORP·Filed 2023·Application pending·0 cites
- 0549US2024332088A1Modulation of chip performance by controlling transistor gate profileINTEL CORP·Filed 2023·Application pending·0 cites
- 0649US2024404917A1Self-aligned via patterning for backside interconnectsINTEL CORP·Filed 2023·Application pending·0 cites
- 0747US2024112916A1Metal gate cut formed after source and drain contactsINTEL CORP·Filed 2022·Application pending·0 cites
- 0847US2024105453A1High aspect ratio metal gate cutsINTEL CORP·Filed 2022·Application pending·0 cites
- 0946US2024213026A1Chemical mechanical polishing of metal gate cuts formed after source and drain contactsINTEL CORP·Filed 2022·Application pending·0 cites
- 1045US2024105452A1Gate cuts with self-forming polymer layerINTEL CORP·Filed 2022·Application pending·0 cites
- 1145US2024113105A1Forming metal gate cuts using multiple passes for depth controlINTEL CORP·Filed 2022·Application pending·0 cites
- 1242US2024105800A1Multi-stage mask etch processINTEL CORP·Filed 2022·Application pending·0 cites
- 1331US2023178424A1Expandable doped oxide films for advanced semiconductor applicationsLAM RES CORP·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →