Inventor · disambiguated record
Rene Oesterholt
Also filed as: OESTERHOLT RENE
10 granted patents·579 citations·filing 2004–2010
93Inventor score
Technology areasG03F
Files withASML NETHERLANDS BV10
Top patents by PatentIndex Score
10 records- 0198US7880901B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2010·Granted Feb 1, 2011·63 cites·10 claims
- 0298US7859686B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2009·Granted Dec 28, 2010·61 cites·15 claims
- 0398US7528965B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2007·Granted May 5, 2009·69 cites·14 claims
- 0498US7408655B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2007·Granted Aug 5, 2008·72 cites·16 claims
- 0598US7292312B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2005·Granted Nov 6, 2007·139 cites·16 claims
- 0698US7256871B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2004·Granted Aug 14, 2007·146 cites·16 claims
- 0788US7374957B2Method of calibrating or qualifying a lithographic apparatus or part thereof, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·11 cites·25 claims
- 0878US7502096B2Lithographic apparatus, calibration method, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Granted Mar 10, 2009·7 cites·22 claims
- 0975US8368902B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2010·Granted Feb 5, 2013·1 cites·16 claims
- 1068US7239368B2Using unflatness information of the substrate table or mask table for decreasing overlayASML NETHERLANDS BV·Filed 2004·Granted Jul 3, 2007·10 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →