Inventor · disambiguated record
Reinder Teun Plug
Also filed as: PLUG REINDER T · PLUG REINDER TEUN
14 granted patents·3 pending applications·184 citations·filing 1999–2020
92Inventor score
Top patents by PatentIndex Score
17 records- 0198US8411287B2Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrateSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Apr 2, 2013·85 cites·33 claims
- 0295US7502103B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2006·Granted Mar 10, 2009·18 cites·24 claims
- 0389US7480050B2Lithographic system, sensor, and method of measuring properties of a substrateASML NETHERLANDS BV·Filed 2006·Granted Jan 20, 2009·13 cites·22 claims
- 0488US7352439B2Lithography system, control system and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 1, 2008·10 cites·16 claims
- 0587US7586598B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2007·Granted Sep 8, 2009·7 cites·26 claims
- 0687US7511797B2Lithography system, control system and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Mar 31, 2009·9 cites·20 claims
- 0781US10884342B2Method and apparatus for predicting performance of a metrology systemASML NETHERLANDS BV·Filed 2016·Granted Jan 5, 2021·2 cites·20 claims
- 0881US7961309B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2009·Granted Jun 14, 2011·4 cites·20 claims
- 0981US7659988B2Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Feb 9, 2010·7 cites·18 claims
- 1060US6420716B1Servo control method and its application in a lithographic apparatusASML NETHERLANDS BV·Filed 1999·Granted Jul 16, 2002·25 cites·14 claims
- 1158US8636458B2Integrated post-exposure bake trackAUER-JONGEPIER SUZAN L·Filed 2007·Granted Jan 28, 2014·2 cites·21 claims
- 1254US11287748B2Guided patterning device inspectionASML NETHERLANDS BV·Filed 2019·Granted Mar 29, 2022·0 cites·20 claims
- 1349US7113253B2Method, apparatus and computer product for substrate processingASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·2 cites·26 claims
- 1449US2022050391A1Methods and apparatus for estimating substrate shapeASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1548US7679714B2Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 16, 2010·0 cites·12 claims
- 1643US2008148875A1Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1742US2019235394A1Method of patterning at least a layer of a semiconductor deviceASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →