Inventor · disambiguated record
Richard Hogle
Also filed as: HOGLE RICHARD · HOGLE RICHARD A · HOGLE RICHARD ALLEN
9 granted patents·16 pending applications·472 citations·filing 1980–2012
90Inventor score
Top patents by PatentIndex Score
25 records- 0194US6818566B2Thermal activation of fluorine for use in a semiconductor chamberBOC GROUP INC·Filed 2002·Granted Nov 16, 2004·280 cites·24 claims
- 0292US4314525AFluidized bed silicon deposition from silaneCALIFORNIA INST OF TECHN·Filed 1980·Granted Feb 9, 1982·73 cites·17 claims
- 0388US7514119B2Method and apparatus for using solution based precursors for atomic layer depositionLINDE INC·Filed 2006·Granted Apr 7, 2009·16 cites·1 claims
- 0482US6955707B2Method of recycling fluorine using an adsorption purification processBOC GROUP INC·Filed 2002·Granted Oct 18, 2005·31 cites·18 claims
- 0580US4444811AFluidized bed silicon deposition from silaneCALIFORNIA INST OF TECHN·Filed 1981·Granted Apr 24, 1984·42 cites·21 claims
- 0670US7638106B2Method of treating a gas streamEDWARDS LTD·Filed 2006·Granted Dec 29, 2009·2 cites·9 claims
- 0765US6936537B2Methods for forming low-k dielectric filmsBOC GROUP INC·Filed 2002·Granted Aug 30, 2005·11 cites·30 claims
- 0856US2011041872A1Rapid supply of fluorine source gas to remote plasma for chamber cleaningHOGLE RICHARD ALLEN·Filed 2009·Application pending·0 cites
- 0951US5485736ASeamless cylinder shell constructionBOC GROUP INC·Filed 1994·Granted Jan 23, 1996·14 cites·5 claims
- 1049US2009220374A1Method and apparatus for using solution precursors for atomic layer depositionMA CE·Filed 2009·Application pending·0 cites
- 1148US2006276049A1High efficiency trap for deposition processBAILEY CHRISTOPHER M·Filed 2005·Application pending·0 cites
- 1247US2009068086A1Method and apparatus for the production of high purity tungsten hexafluorideHOGLE RICHARD ALLEN·Filed 2007·Application pending·0 cites
- 1347US2013133697A1Prevention of post-pecvd vacuum and abatement system fouling using a fluorine containing cleaning gas chamberSTOCKMAN PAUL A·Filed 2012·Application pending·0 cites
- 1445US2005250347A1Method and apparatus for maintaining by-product volatility in deposition processBAILEY CHRISTOPHER M·Filed 2004·Application pending·0 cites
- 1545US2012295038A1Method and apparatus for using solution based precursors for atomic layer depositionMA CE·Filed 2011·Application pending·0 cites
- 1645US2012294753A1Method and apparatus for using solution based precursors for atomic layer depositionMA CE·Filed 2011·Application pending·0 cites
- 1743US2007079849A1Integrated chamber cleaning systemHOGLE RICHARD·Filed 2005·Application pending·0 cites
- 1843US2007074743A1H2 conditioning of chamber following cleaning cycleMCFARLANE GRAHAM·Filed 2005·Application pending·0 cites
- 1943US2006042462A1Method of recycling fluorine using an adsorption purification processEZELL EDWARD F·Filed 2005·Application pending·0 cites
- 2042US6361020B1Valve for use with high purity gasBOC GROUP PLC·Filed 2000·Granted Mar 26, 2002·3 cites·2 claims
- 2141US2005191225A1Methods and apparatus for disposal of hydrogen from fluorine generation, and fluorine generators including sameFiled 2004·Application pending·0 cites
- 2235US2004074516A1Sub-atmospheric supply of fluorine to semiconductor process chamberFiled 2002·Application pending·0 cites
- 2334US2006016459A1High rate etching using high pressure F2 plasma with argon dilutionMCFARLANE GRAHAM·Filed 2005·Application pending·0 cites
- 2431US2013276820A1Chemical vapor deposition chamber cleaning with molecular fluorineCIGAL JEAN-CHARLES·Filed 2011·Application pending·0 cites
- 2528US2011017140A1Method of treating a gas streamBAILEY CHRISTOPHER MARK·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Richard Hogle files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →