Inventor · disambiguated record
Risako Matsuda
Also filed as: Matsuda risako
7 granted patents·2 pending applications·0 citations·filing 2019–2022
66Inventor score
Files withTOKYO ELECTRON LTD9
Top patents by PatentIndex Score
9 records- 0150US11326914B2Flow rate measurement apparatus and method for more accurately measuring gas flow to a substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted May 10, 2022·0 cites·17 claims
- 0248US11742228B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·0 cites·16 claims
- 0346US11644121B2Gas inspection method, substrate processing method, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted May 9, 2023·0 cites·10 claims
- 0446US2023034399A1Substrate processing system and method of processing substrateTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0545US2021257197A1Substrate processing method, gas flow evaluation substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0641US11585717B2Method for calibrating plurality of chamber pressure sensors and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Feb 21, 2023·0 cites·16 claims
- 0741US11555755B2Method of calibrating multiple chamber pressure sensorsTOKYO ELECTRON LTD·Filed 2021·Granted Jan 17, 2023·0 cites·8 claims
- 0839US11899476B2Method and apparatus for measuring gas flowTOKYO ELECTRON LTD·Filed 2021·Granted Feb 13, 2024·0 cites·9 claims
- 0939US11292035B2Method for cleaning gas supply line and processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Apr 5, 2022·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →