Inventor · disambiguated record
Risako Miyoshi
Also filed as: MIYOSHI RISAKO
15 granted patents·1 pending application·15 citations·filing 2005–2019
86Inventor score
Top patents by PatentIndex Score
16 records- 0186US10692743B2Method of inspecting gas supply systemTOKYO ELECTRON LTD·Filed 2018·Granted Jun 23, 2020·5 cites·11 claims
- 0283US9236230B2Plasma processing apparatus and gas supply method thereforKATO YOSHIYUKI·Filed 2012·Granted Jan 12, 2016·3 cites·6 claims
- 0375US10692744B2Method of inspecting gas supply systemTOKYO ELECTRON LTD·Filed 2018·Granted Jun 23, 2020·2 cites·4 claims
- 0473US10871786B2Substrate processing system and method of determining flow rate of gasTOKYO ELECTRON LTD·Filed 2019·Granted Dec 22, 2020·2 cites·5 claims
- 0572US10876870B2Method of determining flow rate of a gas in a substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Dec 29, 2020·1 cites·9 claims
- 0665US10168049B2Method for preventing explosion of exhaust gas in decompression processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jan 1, 2019·1 cites·7 claims
- 0763US9240307B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jan 19, 2016·1 cites·6 claims
- 0846US10424466B2Method for inspecting shower plate of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Sep 24, 2019·0 cites·8 claims
- 0942US10859426B2Method of inspecting flow rate measuring systemTOKYO ELECTRON LTD·Filed 2018·Granted Dec 8, 2020·0 cites·7 claims
- 1042US8597401B2Exhausting method and gas processing apparatusAMIKURA NORIHIKO·Filed 2011·Granted Dec 3, 2013·0 cites·9 claims
- 1141US10031007B2Method of calculating output flow rate of flow rate controllerTOKYO ELECTRON LTD·Filed 2016·Granted Jul 24, 2018·0 cites·4 claims
- 1240US11231313B2Method of obtaining output flow rate of flow rate controller and method of processing workpieceTOKYO ELECTRON LTD·Filed 2018·Granted Jan 25, 2022·0 cites·9 claims
- 1340US10788356B2Method of inspecting gas supply system, method of calibrating flow controller, and method of calibrating secondary reference deviceTOKYO ELECTRON LTD·Filed 2017·Granted Sep 29, 2020·0 cites·5 claims
- 1438US2007160447A1Semiconductor treating deviceTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1537US10845119B2Method of arranging treatment processTOKYO ELECTRON LTD·Filed 2017·Granted Nov 24, 2020·0 cites·20 claims
- 1635US10274972B2Method of inspecting gas supply systemTOKYO ELECTRON LTD·Filed 2016·Granted Apr 30, 2019·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →