Inventor · disambiguated record
Rieko Nishimura
Also filed as: NISHIMURA RIEKO
22 granted patents·3 pending applications·75 citations·filing 2006–2022
93Inventor score
Top patents by PatentIndex Score
25 records- 0190US7834333B2Charged particle beam lithography system and method for evaluating the sameNUFLARE TECHNOLOGY INC·Filed 2007·Granted Nov 16, 2010·13 cites·14 claims
- 0287US9147553B2Method for acquiring settling timeNUFLARE TECHNOLOGY INC·Filed 2015·Granted Sep 29, 2015·5 cites·10 claims
- 0387US8779379B2Acquisition method of charged particle beam deflection shape error and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2013·Granted Jul 15, 2014·8 cites·16 claims
- 0484US7679068B2Method of calculating deflection aberration correcting voltage and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Mar 16, 2010·8 cites·14 claims
- 0583US8872139B2Settling time acquisition methodNUFLARE TECHNOLOGY INC·Filed 2014·Granted Oct 28, 2014·8 cites·10 claims
- 0682US7705322B2Charged-particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Apr 27, 2010·6 cites·9 claims
- 0781US8183544B2Correcting substrate for charged particle beam lithography apparatusTSURUTA KAORU·Filed 2009·Granted May 22, 2012·10 cites·8 claims
- 0880US7893411B2Charged-particle beam writing apparatus and charged-particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Feb 22, 2011·5 cites·9 claims
- 0979US10283314B2Charged particle beam writing apparatus, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted May 7, 2019·2 cites·13 claims
- 1079US8803108B2Method for acquiring settling timeNUFLARE TECHNOLOGY INC·Filed 2013·Granted Aug 12, 2014·4 cites·16 claims
- 1178US9659746B2Adjustment method for charged particle beam drawing apparatus and charged particle beam drawing methodNUFLARE TECHNOLOGY INC·Filed 2016·Granted May 23, 2017·2 cites·9 claims
- 1277US10755893B2Charged particle beam writing method and charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Aug 25, 2020·1 cites·10 claims
- 1368US8748064B2Charged particle beam drawing method and charged particle beam drawing apparatusNISHIMURA RIEKO·Filed 2012·Granted Jun 10, 2014·3 cites·18 claims
- 1460US11901156B2Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing methodNUFLARE TECHNOLOGY INC·Filed 2022·Granted Feb 13, 2024·0 cites·12 claims
- 1560US10483082B2Evaluation method, correction method, recording medium and electron beam lithography systemNUFLARE TECHNOLOGY INC·Filed 2018·Granted Nov 19, 2019·0 cites·9 claims
- 1659US11211227B2Multi charged particle beam evaluation method and multi charged particle beam writing deviceNUFLARE TECHNOLOGY INC·Filed 2020·Granted Dec 28, 2021·0 cites·17 claims
- 1755US9997329B2Evaluation method, correction method, recording medium and electron beam lithography systemNUFLARE TECHNOLOGY INC·Filed 2016·Granted Jun 12, 2018·0 cites·2 claims
- 1853US7777205B2Electron beam lithography systemNUFLARE TECHNOLOGY INC·Filed 2008·Granted Aug 17, 2010·0 cites·6 claims
- 1948US10622186B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Apr 14, 2020·0 cites·10 claims
- 2046US2020013584A1Method of obtaining dose correction amount, charged particle beam writing method, and charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Application pending·0 cites
- 2145US10468232B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Nov 5, 2019·0 cites·10 claims
- 2244US10586682B2Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plateNUFLARE TECHNOLOGY INC·Filed 2018·Granted Mar 10, 2020·0 cites·10 claims
- 2342US2007243487A1Forming method of resist pattern and writing method of charged particle beamNUFLARE TECHNOLOGY INC·Filed 2007·Application pending·0 cites
- 2438US10345724B2Position correction method of stage mechanism and charged particle beam lithography apparatusNUFLARE TECHNOLOGY INC·Filed 2017·Granted Jul 9, 2019·0 cites·21 claims
- 2536US2010178611A1Lithography method of electron beamNUFLARE TECHNOLOGY INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →