Inventor · disambiguated record
Robert D. Harned
Also filed as: HARNED ROBERT D
12 granted patents·73 citations·filing 2004–2010
89Inventor score
Top patents by PatentIndex Score
12 records- 0188US7158215B2Large field of view protection optical system with aberration correctability for flat panel displaysASML HOLDING NV·Filed 2004·Granted Jan 2, 2007·27 cites·77 claims
- 0285US7643128B2Large field of view projection optical system with aberration correctabilityASML HOLDING NV·Filed 2006·Granted Jan 5, 2010·6 cites·26 claims
- 0380US7678458B2Bonding silicon silicon carbide to glass ceramicsASML HOLDING NV·Filed 2007·Granted Mar 16, 2010·6 cites·13 claims
- 0473US7184124B2Lithographic apparatus having an adjustable projection system and device manufacturing methodASML HOLDING NV·Filed 2004·Granted Feb 27, 2007·13 cites·24 claims
- 0572US7443514B2Diffractive null corrector employing a spatial light modulatorASML HOLDING NV·Filed 2006·Granted Oct 28, 2008·7 cites·20 claims
- 0668US8168017B2Bonding silicon silicon carbide to glass ceramicsLIPSON MATTHEW·Filed 2010·Granted May 1, 2012·2 cites·3 claims
- 0765US7826142B2Method for improved optical design using deterministically defined surfacesASML HOLDING NV·Filed 2005·Granted Nov 2, 2010·4 cites·7 claims
- 0853US7224469B2Optical system alignment system and method with high accuracy and simple operationASML HOLDING NV·Filed 2004·Granted May 29, 2007·7 cites·15 claims
- 0945US7342701B2Multiple illumination source exposure apparatusASML HOLDING NV·Filed 2005·Granted Mar 11, 2008·0 cites·19 claims
- 1043US7420722B2Multiple illumination source exposure apparatusASML HOLDING NV·Filed 2006·Granted Sep 2, 2008·0 cites·9 claims
- 1143US7405802B2Large field of view 2X magnification projection optical system for FPD manufactureASML HOLDING NV·Filed 2004·Granted Jul 29, 2008·1 cites·51 claims
- 1241US7426076B2Projection system for a lithographic apparatusASML HOLDING NV·Filed 2004·Granted Sep 16, 2008·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →