Inventor · disambiguated record
Rode R. Mora
Also filed as: MORA RODE R
12 granted patents·4 pending applications·94 citations·filing 2003–2014
90Inventor score
Top patents by PatentIndex Score
16 records- 0189US7579243B2Split gate memory cell methodFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Aug 25, 2009·18 cites·20 claims
- 0285US7528078B2Process of forming electronic device including a densified nitride layer adjacent to an opening within a semiconductor layerFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted May 5, 2009·11 cites·20 claims
- 0383US7939880B2Split gate non-volatile memory cellFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted May 10, 2011·11 cites·21 claims
- 0477US8513066B2Method of making an inverted-T channel transistorMATHEW LEO·Filed 2005·Granted Aug 20, 2013·6 cites·11 claims
- 0577US6951783B2Confined spacers for double gate transistor semiconductor fabrication processFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Oct 4, 2005·23 cites·19 claims
- 0670US8766362B2Shallow trench isolation for SOI structures combining sidewall spacer and bottom linerLOIKO KONSTANTIN V·Filed 2012·Granted Jul 1, 2014·2 cites·19 claims
- 0768US8236638B2Shallow trench isolation for SOI structures combining sidewall spacer and bottom linerLOIKO KONSTANTIN V·Filed 2007·Granted Aug 7, 2012·3 cites·23 claims
- 0868US7998822B2Semiconductor fabrication process including silicide stringer removal processingFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted Aug 16, 2011·2 cites·21 claims
- 0965US7125805B2Method of semiconductor fabrication incorporating disposable spacer into elevated source/drain processingFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Oct 24, 2006·11 cites·12 claims
- 1063US7829447B2Semiconductor structure pattern formationFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Nov 9, 2010·7 cites·21 claims
- 1151US2014299935A1Shallow trench isolation for soi structures combining sidewall spacer and bottom linerLOIKO KONSTANTIN V·Filed 2014·Application pending·0 cites
- 1250US7446006B2Semiconductor fabrication process including silicide stringer removal processingFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Nov 4, 2008·0 cites·7 claims
- 1341US7687370B2Method of forming a semiconductor isolation trenchFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Mar 30, 2010·0 cites·10 claims
- 1441US2007224772A1Method for forming a stressor structureFREESCALE SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
- 1539US2007249127A1Electronic device including a semiconductor layer and a sidewall spacer and a process of forming the sameFREESCALE SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
- 1636US2007197011A1Method for improving self-aligned silicide extendibility with spacer recess using a stand-alone recess etch integrationFREESCALE SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →