Inventor · disambiguated record
Ronald Nasman
Also filed as: NASMAN RONALD · NASMAN RONALD W
27 granted patents·17 pending applications·106 citations·filing 1992–2024
94Inventor score
Files withTOKYO ELECTRON LTD37NASMAN RONALD4DIGITAL EQUIPMENT CORP1FUJISATO TOSHIAKI1HOHMANN II RICHARD K1
Top patents by PatentIndex Score
44 records- 0193US9718082B2Inline dispense capacitorTOKYO ELECTRON LTD·Filed 2015·Granted Aug 1, 2017·12 cites·19 claims
- 0291US8272347B2High temperature gas heating device for a vapor deposition systemNASMAN RONALD·Filed 2009·Granted Sep 25, 2012·13 cites·19 claims
- 0390US8194384B2High temperature electrostatic chuck and method of usingNASMAN RONALD·Filed 2008·Granted Jun 5, 2012·27 cites·37 claims
- 0485US8291856B2Gas heating device for a vapor deposition systemNASMAN RONALD·Filed 2008·Granted Oct 23, 2012·9 cites·17 claims
- 0583US9523151B2Vaporizer unit with open cell core and method of operatingTOKYO ELECTRON LTD·Filed 2014·Granted Dec 20, 2016·2 cites·19 claims
- 0680US10403501B2High-purity dispense systemTOKYO ELECTRON LTD·Filed 2017·Granted Sep 3, 2019·3 cites·18 claims
- 0780US9987655B2Inline dispense capacitor systemTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·3 cites·15 claims
- 0879US10035113B2Method and system for a spiral mixerTOKYO ELECTRON LTD·Filed 2015·Granted Jul 31, 2018·2 cites·18 claims
- 0979US8592712B2Mounting table structure and plasma film forming apparatusFUJISATO TOSHIAKI·Filed 2010·Granted Nov 26, 2013·6 cites·12 claims
- 1074US12341053B2System for backside deposition of a substrateTOKYO ELECTRON LTD·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 1173US12506019B2Wafer chuck designs and methods for retaining a processing liquid on a surface of a semiconductor waferTOKYO ELECTRON LTD·Filed 2024·Granted Dec 23, 2025·0 cites·22 claims
- 1272US2025285884A1Wet Processing Systems Having Novel Wafer Chuck Designs For Retaining A Processing Liquid On A Surface Of A Semiconductor SubstrateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1371US11360388B2Critical dimension correction via calibrated trim dosingTOKYO ELECTRON LTD·Filed 2019·Granted Jun 14, 2022·1 cites·20 claims
- 1471US2025303501A1Fabrication of high-strength and lightweight beams and structuresTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1571US2024399422A1Method and single wafer processing system for processing of semiconductor wafersTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1669US7959775B2Thermal stress-failure-resistant dielectric windows in vacuum processing systemsTOKYO ELECTRON LTD·Filed 2006·Granted Jun 14, 2011·2 cites·2 claims
- 1767US12103052B2Method and single wafer processing system for processing of semiconductor wafersTOKYO ELECTRON LTD·Filed 2023·Granted Oct 1, 2024·0 cites·22 claims
- 1867US10712663B2High-purity dispense unitTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·6 claims
- 1965US2025129475A1Multiple input post mix showerheadTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2061US12447513B2Gas cabinet with reduced gas emissions and exhaust flow rateTOKYO ELECTRON LTD·Filed 2023·Granted Oct 21, 2025·0 cites·17 claims
- 2160US2025259863A1Wet processing system and nozzle for dispensing a liquid laterally across a semiconductor waferTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2259US11920782B2Streamlined vaporizer coresTOKYO ELECTRON LTD·Filed 2020·Granted Mar 5, 2024·0 cites·18 claims
- 2358US11383211B2Point-of-use dynamic concentration delivery system with high flow and high uniformityTOKYO ELECTRON LTD·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 2458US2025357099A1Wafer cleaning method and systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2558US2025323035A1Wafer cleaning method and system using heated functional plateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2657US2025264430A1Apparatus and method for plasma measurementTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2757US2025308950A1Wafer processing method and system using heated functional plateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2857US2025379045A1Wafer cleaning method and systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2956US2009226614A1Porous gas heating device for a vapor deposition systemTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3055US2025299981A1System and method for adjusting etch selectivity of etchant solutionTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3154US11908728B2System for backside deposition of a substrateTOKYO ELECTRON LTD·Filed 2018·Granted Feb 20, 2024·0 cites·20 claims
- 3253US10685857B2Dispense nozzle with a shielding deviceTOKYO ELECTRON LTD·Filed 2018·Granted Jun 16, 2020·0 cites·8 claims
- 3352US5188324ASelf-retaining mounting blockDIGITAL EQUIPMENT CORP·Filed 1992·Granted Feb 23, 1993·21 cites·9 claims
- 3452US2014116339A1Process gas diffuser assembly for vapor deposition systemTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 3548US2012312234A1Process gas diffuser assembly for vapor deposition systemNASMAN RONALD·Filed 2011·Application pending·0 cites
- 3648US2010248397A1High temperature susceptor having improved processing uniformityTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3747US8344300B2Device to reduce shadowing during radiative heating of a substrateTOKYO ELECTRON LTD·Filed 2010·Granted Jan 1, 2013·0 cites·20 claims
- 3847US2017110345A1Dispense nozzle with a shielding deviceTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3945US10426001B2Processing system for electromagnetic wave treatment of a substrate at microwave frequenciesTOKYO ELECTRON LTD·Filed 2014·Granted Sep 24, 2019·0 cites·14 claims
- 4044US10807117B2Dispense nozzle with a dynamic liquid plugTOKYO ELECTRON LTD·Filed 2016·Granted Oct 20, 2020·0 cites·20 claims
- 4141US8290970B2System and method for offering one or more drivers to run on the computerHOHMANN II RICHARD K·Filed 2004·Granted Oct 16, 2012·4 cites·24 claims
- 4238US10354872B2High-precision dispense system with meniscus controlTOKYO ELECTRON LTD·Filed 2017·Granted Jul 16, 2019·0 cites·18 claims
- 4338US10256121B2Heated stage with variable thermal emissivity method and apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Apr 9, 2019·0 cites·21 claims
- 4436US2018066363A1Vortical atomizing nozzle assembly, vaporizer, and related methods for substrate processing systemsTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →