Inventor · disambiguated record
Robert Rowan
Also filed as: ROWAN JR ROBERT C · ROWAN JR ROBERT CLARK · ROWAN ROBERT C · ROWAN ROBERT C JR
4 granted patents·1 pending application·1,515 citations·filing 1997–2005
85Inventor score
Files withTOKYO ELECTRON LTD5
Top patents by PatentIndex Score
5 records- 0198US6368987B1Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactionsTOKYO ELECTRON LTD·Filed 2000·Granted Apr 9, 2002·642 cites·11 claims
- 0298US6161500AApparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactionsTOKYO ELECTRON LTD·Filed 1997·Granted Dec 19, 2000·814 cites·30 claims
- 0393US7001491B2Vacuum-processing chamber-shield and multi-chamber pumping methodTOKYO ELECTRON LTD·Filed 2003·Granted Feb 21, 2006·45 cites·16 claims
- 0459US6395095B1Process apparatus and method for improved plasma processing of a substrateTOKYO ELECTRON LTD·Filed 1999·Granted May 28, 2002·14 cites·15 claims
- 0545US2006037537A1Vacuum-processing chamber-shield and multi-chamber pumping methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →