Inventor · disambiguated record
Rolf Seltmann
Also filed as: SELTMANN ROLF
13 granted patents·1 pending application·206 citations·filing 1993–2016
91Inventor score
Files withADVANCED MICRO DEVICES INC7SELTMANN ROLF2BARLOVIC ROBERT1FRAUNHOFER GES FORSCHUNG1GLOBALFOUNDRIES INC1
Top patents by PatentIndex Score
14 records- 0191US7842442B2Method and system for reducing overlay errors within exposure fields by APC control strategiesADVANCED MICRO DEVICES INC·Filed 2007·Granted Nov 30, 2010·23 cites·19 claims
- 0289US5496669ASystem for detecting a latent image using an alignment apparatusIMEC INTER UNI MICRO ELECTR·Filed 1993·Granted Mar 5, 1996·87 cites·19 claims
- 0381US7325224B2Method and system for increasing product yield by controlling lithography on the basis of electrical speed dataADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 29, 2008·22 cites·41 claims
- 0476US8039181B2Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenarioADVANCED MICRO DEVICES INC·Filed 2009·Granted Oct 18, 2011·5 cites·19 claims
- 0573US7618755B2Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fieldsADVANCED MICRO DEVICES INC·Filed 2006·Granted Nov 17, 2009·3 cites·20 claims
- 0669US8605250B2Method and system for detecting particle contamination in an immersion lithography toolSELTMANN ROLF·Filed 2010·Granted Dec 10, 2013·2 cites·21 claims
- 0768US5936713AMethod and device for producing features on a photolithographic layerFRAUNHOFER GES FORSCHUNG·Filed 1996·Granted Aug 10, 1999·32 cites·15 claims
- 0863US8332783B2Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulationsSELTMANN ROLF·Filed 2010·Granted Dec 11, 2012·2 cites·20 claims
- 0962US8155770B2Method and apparatus for dispatching workpieces to tools based on processing and performance historyBARLOVIC ROBERT·Filed 2009·Granted Apr 10, 2012·6 cites·18 claims
- 1056US6493063B1Critical dimension control improvement method for step and scan photolithographyADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 10, 2002·17 cites·12 claims
- 1153US7006195B2Method and system for improving exposure uniformity in a step and repeat processADVANCED MICRO DEVICES INC·Filed 2003·Granted Feb 28, 2006·4 cites·2 claims
- 1248US6946411B2Method and system for improving the efficiency of a mechanical alignment toolADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 20, 2005·3 cites·31 claims
- 1338US2010110402A1Focus correction in lithography tools via lens aberration controlWIRTZ RENE·Filed 2009·Application pending·0 cites
- 1428US9966315B2Advanced process control methods for process-aware dimension targetingGLOBALFOUNDRIES INC·Filed 2016·Granted May 8, 2018·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →