Inventor · disambiguated record
Roy Werkman
Also filed as: WERKMAN ROY
25 granted patents·9 pending applications·87 citations·filing 2004–2024
93Inventor score
Files withASML NETHERLANDS BV34
Top patents by PatentIndex Score
34 records- 0192US7415319B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Aug 19, 2008·17 cites·14 claims
- 0290US11994845B2Determining a correction to a processASML NETHERLANDS BV·Filed 2021·Granted May 28, 2024·2 cites·20 claims
- 0389US10627729B2Calibration method for a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·4 cites·15 claims
- 0488US7042552B1Alignment strategy optimization methodASML NETHERLANDS BV·Filed 2004·Granted May 9, 2006·33 cites·8 claims
- 0585US7433038B2Alignment of substrates for bondingASML NETHERLANDS BV·Filed 2006·Granted Oct 7, 2008·11 cites·20 claims
- 0684US7468795B2Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the sameASML NETHERLANDS BV·Filed 2006·Granted Dec 23, 2008·9 cites·34 claims
- 0782US11378891B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·1 cites·20 claims
- 0880US12493285B2Determining a correction to a processASML NETHERLANDS BV·Filed 2024·Granted Dec 9, 2025·0 cites·20 claims
- 0979US10816904B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·2 cites·26 claims
- 1079US7969577B2Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrateASML NETHERLANDS BV·Filed 2006·Granted Jun 28, 2011·5 cites·11 claims
- 1175US11106141B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2018·Granted Aug 31, 2021·1 cites·21 claims
- 1271US11669017B2Method for controlling a manufacturing apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2018·Granted Jun 6, 2023·1 cites·20 claims
- 1371US11442367B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2021·Granted Sep 13, 2022·0 cites·20 claims
- 1469US11086305B2Determining a correction to a processASML NETHERLANDS BV·Filed 2021·Granted Aug 10, 2021·0 cites·28 claims
- 1567US10884345B2Calibration method for a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Jan 5, 2021·0 cites·15 claims
- 1667US2022342319A1Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1765US12124179B2Method of wafer alignment using at resolution metrology on product featuresASML NETHERLANDS BV·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 1860US12366809B2Methods and apparatus for controlling a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Jul 22, 2025·0 cites·20 claims
- 1959US11435673B2Method of determining a set of metrology points on a substrate, associated apparatus and computer programASML NETHERLANDS BV·Filed 2020·Granted Sep 6, 2022·0 cites·20 claims
- 2059US11372338B2Method for evaluating control strategies in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Jun 28, 2022·1 cites·22 claims
- 2156US11754931B2Method for determining corrections for lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Sep 12, 2023·0 cites·20 claims
- 2256US2024036479A1Method of determining at least a target layout and associated metrology apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2355US2023333485A1Target structure and associated methods and apparatusASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2455US2024184254A1Causal convolution network for process controlASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2553US2025199419A1Methods of metrology and associated devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2652US2024310738A1Method of determining a correction for at least one control parameter in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2751US2023400778A1Methods and computer programs for configuration of a sampling scheme generation modelASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2849US12276919B2Method for controlling a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Apr 15, 2025·0 cites·20 claims
- 2949US2022413391A1Method and apparatus for determining control data for a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 3047US11327406B2Estimating a parameter of a substrateASML NETHERLANDS BV·Filed 2019·Granted May 10, 2022·0 cites·20 claims
- 3146US10928737B2Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer programASML NETHERLANDS BV·Filed 2017·Granted Feb 23, 2021·0 cites·20 claims
- 3246US10725372B2Method and apparatus for reticle optimizationASML NETHERLANDS BV·Filed 2016·Granted Jul 28, 2020·0 cites·20 claims
- 3343US2022291593A1Method and apparatus for lithographic process performance determinationASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 3442US11300887B2Method to change an etch parameterASML NETHERLANDS BV·Filed 2017·Granted Apr 12, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →