Inventor · disambiguated record
Rong-Chein Richard Wu
Also filed as: WU RONG-CHEIN R · WU RONG-CHEIN RICHARD
14 granted patents·6 pending applications·85 citations·filing 1995–2016
91Inventor score
Top patents by PatentIndex Score
20 records- 0197US8883250B2Methods of rejuvenating sputtering targetsSTARCK H C INC·Filed 2013·Granted Nov 11, 2014·13 cites·15 claims
- 0289US7837929B2Methods of making molybdenum titanium sputtering plates and targetsSTARCK H C INC·Filed 2005·Granted Nov 23, 2010·16 cites·22 claims
- 0388US8715386B2Process for preparing metal powders having low oxygen content, powders so-produced and uses thereofSHEKHTER LEONID N·Filed 2012·Granted May 6, 2014·7 cites·54 claims
- 0485US8226741B2Process for preparing metal powders having low oxygen content, powders so-produced and uses thereofSHEKHTER LEONID N·Filed 2007·Granted Jul 24, 2012·11 cites·30 claims
- 0575US9309591B2Methods of depositing thin films using molybdenum sputtering targetsLEMON BRAD·Filed 2015·Granted Apr 12, 2016·1 cites·33 claims
- 0674US9017600B2Methods of forming molybdenum sputtering targetsLEMON BRAD·Filed 2013·Granted Apr 28, 2015·1 cites·28 claims
- 0768US6338832B1Process for producing niobium and tantalum compoundsCABOT CORP·Filed 1995·Granted Jan 15, 2002·21 cites·17 claims
- 0867US8911528B2Methods of making molybdenum titanium sputtering plates and targetsGAYDOS MARK E·Filed 2010·Granted Dec 16, 2014·1 cites·2 claims
- 0966US7452488B2Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use thereinSTARCK H C INC·Filed 2006·Granted Nov 18, 2008·1 cites·9 claims
- 1064US7416789B2Refractory metal substrate with improved thermal conductivitySTARCK H C INC·Filed 2004·Granted Aug 26, 2008·10 cites·33 claims
- 1163US9926623B2Methods of forming molybdenum sputtering targetsLEMON BRAD·Filed 2016·Granted Mar 27, 2018·0 cites·25 claims
- 1258US7276225B2Process for producing niobium and tantalum compoundsCABOT CORP·Filed 2005·Granted Oct 2, 2007·2 cites·27 claims
- 1357US2014299466A1High-density metallic sputtering targetsKUMAR PRABHAT·Filed 2014·Application pending·0 cites
- 1454US2008314737A1Methods of Making Molybdenium Titanium Sputtering Plates and TargetsGAYDOS MARK·Filed 2006·Application pending·0 cites
- 1553US2008078268A1Process for preparing metal powders having low oxygen content, powders so-produced and uses thereofSTARCK H C INC·Filed 2006·Application pending·0 cites
- 1651US6984370B2Process for producing niobium and tantalum compoundsCABOT CORP·Filed 2002·Granted Jan 10, 2006·1 cites·27 claims
- 1750US8784729B2High density refractory metals and alloys sputtering targetsKUMAR PRABHAT·Filed 2007·Granted Jul 22, 2014·0 cites·9 claims
- 1848US2008087866A1Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use thereinH C STARK INC·Filed 2006·Application pending·0 cites
- 1946US2006042728A1Molybdenum sputtering targetsLEMON BRAD·Filed 2004·Application pending·0 cites
- 2043US2007071985A1Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use thereinKUMAR PRABHAT·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →