Inventor · disambiguated record
Ruiying Hao
Also filed as: HAO RUIYING
0 granted patents·16 pending applications·0 citations·filing 2014–2024
Top patents by PatentIndex Score
16 records- 0163US2024319603A1Euv sensitive metal oxide material as underlayer for thin car to improve pattern transferAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0263US2024027916A1Fingerprinting and process control of photosensitive film deposition chamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0362US2023259035A1Characterization of photosensitive materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0462US2025132163A1Engineering epi stacks for extreme wafer thinningAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0560US2015040979A1Silicon Wafers with p-n Junctions by Epitaxial Deposition and Devices Fabricated TherefromCRYSTAL SOLAR INC·Filed 2014·Application pending·0 cites
- 0660US2024429048A1REDUCED STRAIN AND STOP LAYER FOR Si/SiGe EPI STACKSAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0760US2025117754A1Epitaxial film defect determinationAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0860US2025037997A1EPITAXIAL GROWTH OF STRAINED Si/SiGe SUPERLATTICEAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0959US2023124304A1Controlled delivery of low-vapor-pressure precursor into a chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1059US2025113522A13D Memory Mold Film StackAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1158US2023064100A1Process and apparatus to remove metal-containing films from a chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1258US2024194484A1Design, control, and optimization of photosensitivity modulation along photoresist film depthAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1358US2024128061A1Apparatus design for film removal from the bevel and edge of the substrateAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1457US2024012325A1Method to optimize post deposition baking condition of photo resistive materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1550US2022199406A1Vapor deposition of carbon-doped metal oxides for use as photoresistsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1636US2017012149A1High efficiency single crystal silicon solar cell with epitaxially deposited silicon layers with deep junction(s)CRYSTAL SOLAR INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →