Inventor · disambiguated record
Ryuichi Asako
Also filed as: ASAKO RYUICHI
28 granted patents·14 pending applications·35 citations·filing 2003–2025
93Inventor score
Top patents by PatentIndex Score
42 records- 0192US12444606B2Methods for forming vertically layered ionic liquid crystal (ILC) structures on a semiconductor substrateTOKYO ELECTRON LTD·Filed 2023·Granted Oct 14, 2025·2 cites·20 claims
- 0283US11488836B2Apparatus for substrate processingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 1, 2022·1 cites·19 claims
- 0381US8075730B2Apparatus for manufacturing a semiconductor deviceSHIMURA SATORU·Filed 2005·Granted Dec 13, 2011·10 cites·18 claims
- 0477US10304725B2Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired featuresTOKYO ELECTRON LTD·Filed 2017·Granted May 28, 2019·2 cites·25 claims
- 0575US9780037B2Method of processing target objectTOKYO ELECTRON LTD·Filed 2016·Granted Oct 3, 2017·2 cites·13 claims
- 0672US8268721B2Semiconductor device and semiconductor device manufacturing methodASAKO RYUICHI·Filed 2011·Granted Sep 18, 2012·3 cites·11 claims
- 0771US12406862B2Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2023·Granted Sep 2, 2025·0 cites·3 claims
- 0871US10903085B2Method for etching organic regionTOKYO ELECTRON LTD·Filed 2019·Granted Jan 26, 2021·1 cites·19 claims
- 0971US8101507B2Semiconductor device manufacturing method and semiconductor device manufacturing apparatusASAKO RYUICHI·Filed 2009·Granted Jan 24, 2012·3 cites·5 claims
- 1069US7799703B2Processing method and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Sep 21, 2010·3 cites·5 claims
- 1168US8058153B2Method for recovering damage of low dielectric insulating film for manufacturing semiconductor deviceASAKO RYUICHI·Filed 2008·Granted Nov 15, 2011·3 cites·5 claims
- 1267US12379653B2Pattern formation method and photosensitive hard maskTOKYO ELECTRON LTD·Filed 2022·Granted Aug 5, 2025·0 cites·18 claims
- 1367US7902077B2Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gasTOKYO ELECTRON LTD·Filed 2006·Granted Mar 8, 2011·2 cites·11 claims
- 1465US8357615B2Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2008·Granted Jan 22, 2013·2 cites·15 claims
- 1563US12417928B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2023·Granted Sep 16, 2025·0 cites·9 claims
- 1663US8614140B2Semiconductor device manufacturing apparatusASAKO RYUICHI·Filed 2011·Granted Dec 24, 2013·1 cites·4 claims
- 1761US10923332B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Feb 16, 2021·0 cites·12 claims
- 1861US2022403509A1Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1960US10626497B2Method for cleaning components of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Apr 21, 2020·0 cites·12 claims
- 2059US12011738B2Substrate processing method and ionic liquidTOKYO ELECTRON LTD·Filed 2023·Granted Jun 18, 2024·0 cites·18 claims
- 2158US11538693B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Dec 27, 2022·0 cites·17 claims
- 2257US10777425B2Method of processing substrateTOKYO ELECTRON LTD·Filed 2018·Granted Sep 15, 2020·0 cites·20 claims
- 2356US2025191910A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2455US11456184B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Sep 27, 2022·0 cites·8 claims
- 2555US2025231116A1Method for observing surfaceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2655US2023111710A1Purification processing apparatus, substrate processing system, and processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2753US11842900B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 12, 2023·0 cites·18 claims
- 2851US2025174439A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2949US2024318014A1Pattern forming method and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3047US10734204B2Method for cleaning components of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Aug 4, 2020·0 cites·13 claims
- 3147US9892934B2Method for removing halogen and method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted Feb 13, 2018·0 cites·21 claims
- 3247US2009001046A1Substrate processing method, substrate processing apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3346US8288252B2Method for recovering damaged components in lower region of low dielectric insulating filmASAKO RYUICHI·Filed 2011·Granted Oct 16, 2012·0 cites·9 claims
- 3446US2023010867A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3546US2011120650A1Semiconductor device manufacturing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 3644US2012034779A1Apparatus for manufacturing a semiconductor deviceSHIMURA SATORU·Filed 2011·Application pending·0 cites
- 3744US2008045025A1Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3843US2020203150A1Composition for film deposition and film deposition apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 3943US2020277512A1Composition for film deposition and film deposition apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 4043US2020312672A1Composition for film deposition and film deposition apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 4142US10083859B2Coating formation method and semiconductor device manufacturing method using the coating formation methodTOKYO ELECTRON LTD·Filed 2015·Granted Sep 25, 2018·0 cites·16 claims
- 4238US7521098B2Method of processing an organic-filmTOKYO ELECTRON LTD·Filed 2003·Granted Apr 21, 2009·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →