Inventor · disambiguated record
Ryoma Hayakawa
Also filed as: HAYAKAWA RYOMA
1 granted patent·1 pending application·0 citations·filing 2005–2007
13Inventor score
Technology areasH10P
Top patents by PatentIndex Score
2 records- 0143US2008113519A1Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrateSEKISUI CHEMICAL CO LTD·Filed 2007·Application pending·0 cites
- 0234US7507678B2Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrateSEKESUI CHEMICAL CO LTD·Filed 2005·Granted Mar 24, 2009·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →