Inventor · disambiguated record
Ryuta Higuchi
Also filed as: HIGUCHI RYUTA
2 granted patents·3 pending applications·1 citations·filing 2018–2025
29Inventor score
Files withTOKYO ELECTRON LTD5
Top patents by PatentIndex Score
5 records- 0166US2025343028A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0263US2025343027A1Plasma-processing apparatus and plasma-processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0356US10903049B2Plasma processing apparatus and measurement circuitTOKYO ELECTRON LTD·Filed 2018·Granted Jan 26, 2021·1 cites·12 claims
- 0439US2025191883A1Plasma processing apparatus, rf system, and rf control methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0533US11948782B2Control system, control method, recording medium storing control program, and processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Apr 2, 2024·0 cites·11 claims
Join the waitlist — get patent alerts
Get an alert when Ryuta Higuchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →