Inventor · disambiguated record
Ryoichi Hirano
Also filed as: HIRANO RYOICHI
32 granted patents·8 pending applications·615 citations·filing 1983–2025
97Inventor score
Files withTOSHIBA KK17NUFLARE TECHNOLOGY INC12MITSUBISHI ELECTRIC CORP5TOSHIBA MACHINE CO LTD2ISOMURA IKUNAO1
Top patents by PatentIndex Score
40 records- 0196US5151754AMethod and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objectsTOSHIBA KK·Filed 1990·Granted Sep 29, 1992·160 cites·33 claims
- 0292US5519720ASemiconductor light emitting deviceMITSUBISHI ELECTRIC CORP·Filed 1994·Granted May 21, 1996·145 cites·6 claims
- 0390US8254663B2Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removabilityKATAOKA AKIRA·Filed 2009·Granted Aug 28, 2012·14 cites·5 claims
- 0490US6281510B1Sample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 2000·Granted Aug 28, 2001·52 cites·17 claims
- 0586US11004193B2Inspection method and inspection apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted May 11, 2021·2 cites·12 claims
- 0685US10997713B2Inspection device, inspection method, and storage mediumTOSHIBA KK·Filed 2019·Granted May 4, 2021·4 cites·17 claims
- 0783US12373939B2Defect inspection methodNUFLARE TECHNOLOGY INC·Filed 2024·Granted Jul 29, 2025·0 cites·7 claims
- 0883US8442320B2Pattern inspection apparatus and pattern inspection methodISOMURA IKUNAO·Filed 2010·Granted May 14, 2013·6 cites·10 claims
- 0983US6090176ASample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 1998·Granted Jul 18, 2000·62 cites·7 claims
- 1080US10712295B2Electron beam inspection apparatus and electron beam inspection methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted Jul 14, 2020·1 cites·20 claims
- 1174US10775326B2Electron beam inspection apparatus and electron beam inspection methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted Sep 15, 2020·1 cites·11 claims
- 1274US6080990APosition measuring apparatusTOPCON CORP·Filed 1998·Granted Jun 27, 2000·36 cites·10 claims
- 1373US10984978B2Multiple electron beam inspection apparatus and multiple electron beam inspection methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted Apr 20, 2021·1 cites·15 claims
- 1469US11995817B2Defect inspection methodNUFLARE TECHNOLOGY INC·Filed 2021·Granted May 28, 2024·0 cites·12 claims
- 1569US7894051B2Reticle defect inspection apparatus and reticle defect inspection methodTOSHIBA KK·Filed 2008·Granted Feb 22, 2011·2 cites·10 claims
- 1669US5912468ACharged particle beam exposure systemTOSHIBA KK·Filed 1997·Granted Jun 15, 1999·22 cites·10 claims
- 1768US10846846B2Pattern inspection apparatus and pattern inspection methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Nov 24, 2020·1 cites·12 claims
- 1866US5100234AMethod and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objectsTOSHIBA KK·Filed 1990·Granted Mar 31, 1992·18 cites·21 claims
- 1964US2025377602A1Pattern inspection apparatus and pattern inspection methodNUFLARE TECHNOLOGY INC·Filed 2025·Application pending·0 cites
- 2064US2024280500A1Adjustment method of inspection apparatus focus position, and pattern inspection apparatusNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 2163US4838693AMethod and apparatus for setting a gap between first and second objects to a predetermined distanceTOSHIBA KK·Filed 1987·Granted Jun 13, 1989·16 cites·40 claims
- 2262US6411023B1Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons from ion pumpTOSHIBA MACHINE CO LTD·Filed 2000·Granted Jun 25, 2002·5 cites·6 claims
- 2359US6676289B2Temperature measuring method in pattern drawing apparatusTOSHIBA KK·Filed 2001·Granted Jan 13, 2004·10 cites·2 claims
- 2457US10984525B2Pattern inspection method and pattern inspection apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Apr 20, 2021·0 cites·15 claims
- 2553US2006147822A1Appartus and method for forming patternTOSHIBA KK·Filed 2006·Application pending·0 cites
- 2651US8049897B2Reticle defect inspection apparatus and inspection method using thereofTOSHIBA KK·Filed 2008·Granted Nov 1, 2011·0 cites·8 claims
- 2750US4988197AMethod and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objectsTOSHIBA KK·Filed 1988·Granted Jan 29, 1991·8 cites·139 claims
- 2849US5642373AMonolithic semiconductor laser array of radially disposed lasersMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jun 24, 1997·22 cites·2 claims
- 2948US2023170183A1Multi-electron beam inspection device and multi-electron beam inspection methodNUFLARE TECHNOLOGY INC·Filed 2021·Application pending·0 cites
- 3046US6182369B1Pattern forming apparatusTOSHIBA KK·Filed 1998·Granted Feb 6, 2001·10 cites·6 claims
- 3146US2015041645A1Image acquisition apparatus, image acquisition method and defect inspection apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3244US7036980B2Apparatus and method for forming patternTOSHIBA MACHINE CO LTD·Filed 2002·Granted May 2, 2006·0 cites·14 claims
- 3343US2019346769A1Pattern inspection apparatus and pattern inspection methodNUFLARE TECHNOLOGY INC·Filed 2019·Application pending·0 cites
- 3442US6239443B1Apparatus for emitting a beam to a sample used for manufacturing a semiconducor deviceTOSHIBA KK·Filed 1998·Granted May 29, 2001·7 cites·8 claims
- 3536US2012081538A1Pattern inspection apparatusOGAWA RIKI·Filed 2011·Application pending·0 cites
- 3634US5442445ARegistration method and apparatus thereforTOSHIBA KK·Filed 1993·Granted Aug 15, 1995·4 cites·3 claims
- 3734US2016275669A1Defect inspection apparatus, management method of defect inspection apparatus and management apparatus of defect inspection apparatusTOSHIBA KK·Filed 2015·Application pending·0 cites
- 3833US4637845AMethod of manufacturing semiconductor light emitting deviceMITSUBISHI ELECTRIC CORP·Filed 1984·Granted Jan 20, 1987·3 cites·8 claims
- 3932US4561096ABuried semiconductor laser avoiding thyristor actionMITSUBISHI ELECTRIC CORP·Filed 1983·Granted Dec 24, 1985·3 cites·6 claims
- 4029US4504328ALiquid phase epitaxial growth techniqueMITSUBISHI ELECTRIC CORP·Filed 1983·Granted Mar 12, 1985·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →