Appartus and method for forming pattern

Abstract

A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.

1 . A pattern forming method comprising: 
 measuring a temperature of a dummy substrate, which is included in a drawing chamber whose temperature is made constant by a first temperature control unit, using a first temperature measuring device when an original pattern is drawn on the dummy substrate while the dummy substrate is varying in position;    computing temperature distribution of the dummy substrate based on the temperature measured by the first temperature measuring device; and    controlling a second temperature control unit based on the temperature distribution, the second temperature control unit being configured to control a set temperature of a constant-temperature member independently of a temperature of the drawing chamber when the original pattern is drawn on a drawing substrate, and the constant-temperature member being arranged near the drawing substrate.    
     
     
         2 . The pattern forming method according to  claim 1 , wherein the controlling includes controlling the constant-temperature member such that the constant-temperature member is set at a constant set temperature.  
     
     
         3 . The pattern forming method according to  claim 1 , further comprising supplying a correction value to drawing data to draw the original pattern using an energy beam optical system based on the temperature measured by the first temperature measuring device.  
     
     
         4 . A pattern forming method comprising: 
 measuring a temperature of a drawing substrate, which is included in a drawing chamber whose temperature is made constant by a first temperature control unit, using a second temperature measuring device when an original pattern is drawn on the drawing substrate; and    controlling a second temperature control unit based on the temperature measured by the second temperature measuring device, the second temperature control unit being configured to control a set temperature of a constant-temperature member independently of a temperature of the drawing chamber when the original pattern is drawn on the drawing substrate while the drawing substrate is varying in position, and the constant-temperature member being arranged near the drawing substrate.    
     
     
         5 . The pattern forming method according to  claim 4 , wherein the controlling includes controlling the set temperature of the constant-temperature member in accordance with the temperature of the drawing substrate.  
     
     
         6 . The pattern forming method according to  claim 4 , further comprising supplying a correction value to drawing data to draw the original pattern using an energy beam optical system based on the temperature measured by the second temperature measuring device.